Eighth International Symposium on Plasma Chemistry, Tokyo, Japan, 31 August–4 September 1987
This conference is part of the Plasma Chemistry series.
Control and diagnostics of reactive plasma by photochemical and photoionization techniques
Thermal plasma processing in the nineties
Plasma deposition and properties of composite metal/polymer and metal/hard carbon films
Industrial-worthy plasma torches: State-of-the-art
Plasma deposition of amorphous silicon films: an overview on some open questions
Mechanism of the ozone formations in a near liquid nitrogen temperature medium pressure glow discharge positive column
Particle heating in a thermal plasma
Impulse corona simulation for flue gas treatment
Diagnostics of thermal plasma
Inductively coupled plasmas in analytical atomic spectrometry: excitation mechanisms and analytical feasibilities
Plasma polymerization of unsaturated alcohols for deposition of hydrophilic thin film
Plasma and gaseous etching of compounds of Groups III-V
Processing of a thermal plasma flow in a tube
High Tc superconducting oxide films prepared by sputtering
Plasma reactors for process metallurgy applications
Pulse corona induced plasma chemical process: a horizon of new plasma chemical technologies
Amorphous Si and Si-based alloys from glow-discharge plasma
Behaviour of NOx in air-fed ozonizers
Excited states of plasmas for steel surface nitriding and TiN deposition
Mechanisms of decomposition of hydrocarbons in electrical discharges
Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films
Ionized cluster beam (ICB) deposition and processes
Expanding plasma used for plasma deposition
Arc discharge and electrode phenomena
Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films