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Pure Appl. Chem., 1988, Vol. 60, No. 5, pp. 815-820

http://dx.doi.org/10.1351/pac198860050815

Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films

M. R. Wertheimer, M. Moisan, J. E. Klemberg-Sapieha and R. Claude

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