15th International Symposium on Plasma Chemistry, Orléans, France, 9–13 July 2001
This conference is part of the Plasma Chemistry series.
Energy transfers by long-lived species in glows and afterglows
New approaches in thermal plasma technology
Nonequilibrium discharges in air and nitrogen plasmas at atmospheric pressure
Plasma sterilization. Methods and mechanisms
Plasma production of nanocrystalline silicon particles and polymorphous silicon thin films for large-area electronic devices
Plasma processing and chemistry
Study for plasma etching of dielectric film in semiconductor device manufacturing. Review of ASET research project
Diagnostics of etching plasmas
Role of ions in SiO2 deposition with pulsed and continuous helicon plasmas
Diagnostics and insights on PECVD for gas-barrier coatings
Plasma-assisted production of hydrogen from hydrocarbons
Ion-induced damage and annealing of silicon. Molecular dynamics simulations
Plasma treatment of textile fibers
Generation of thermal plasmas in liquid-stabilized and hybrid dc-arc torches
Nonthermal and nonequilibrium effects in high-power pulsed ICP and application to surface modification of materials
Splat formation in plasma-spray coating process
Ultrashort pulsed barrier discharges and applications
"Simple" diagnostics for characterization of low-pressure chemically active plasmas
Comparative characterization of high-density plasma reactors using emission spectroscopy from VUV to NIR
Excilamps as efficient UVVUV light sources
Plasma synthesis of catalytic thin films
Superhard nanocomposite coatings. From basic science toward industrialization
Clustering phenomena in low-pressure reactive plasmas. Basis and applications
How to exploit ion-induced stress relaxation to grow thick c-BN films