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13th International Symposium on Plasma Chemistry (ISPC-13), Beijing, China, 18–22 August 1997

This conference is part of the Plasma Chemistry series.
C.-k. Wu
Preface
1998, Vol. 70, Issue 6, pp. i [Details]
E. Hirota
Plasma diagnosis by high-resolution spectroscopy of transient molecules
1998, Vol. 70, Issue 6, pp. 1145-1150 [Details] [Full text - pdf 513 kB]
G. H. P. M. Swinkels, E. Stoffels, W. W. Stoffels, N. Simons, G. M. W. Kroesen and F. J. de Hoog
Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry
1998, Vol. 70, Issue 6, pp. 1151-1156 [Details] [Full text - pdf 398 kB]
Hrabovsky
Water-stabilized plasma generators
1998, Vol. 70, Issue 6, pp. 1157-1162 [Details] [Full text - pdf 477 kB]
C. Delalondre, Alain Bouvier, Ange Caruso, Namane Méchitoua, O. Simonin and J.-C. Vérité
Fluid dynamic modelling of electric arcs for industrial applications
1998, Vol. 70, Issue 6, pp. 1163-1168 [Details] [Full text - pdf 1076 kB]
G. J. Pietsch and V. I. Gibalov
Dielectric barrier discharges and ozone synthesis
1998, Vol. 70, Issue 6, pp. 1169-1174 [Details] [Full text - pdf 427 kB]
J.-L. Meunier and S. Coulombe
Cold cathode arc attachment: The importance of the high local pressure
1998, Vol. 70, Issue 6, pp. 1175-1180 [Details] [Full text - pdf 387 kB]
M. Losurdo, P. Capezzuto and G. Bruno
Plasmasurface interactions in the processing of iiiv semiconductor materials
1998, Vol. 70, Issue 6, pp. 1181-1186 [Details] [Full text - pdf 553 kB]
Toshiaki Makabe, Jun Matsui and N. Nakano
Phasespace modelling of a radiofrequency plasma interacting with surfaces
1998, Vol. 70, Issue 6, pp. 1187-1191 [Details] [Full text - pdf 375 kB]
K. Terashima, Norio Yamaguchi, Tomoyuki Hattori, Y. Takamura and T. Yoshida
High rate deposition of thick epitaxial films by thermal plasma flash evaporation
1998, Vol. 70, Issue 6, pp. 1193-1197 [Details] [Full text - pdf 494 kB]
Tengcai Ma, Xinlu Deng, Wenqi Lu and J. Zhang
Synthesis of ceramic films on metallic substrates using magnetron-sputtering deposition synchro-enhanced by microwave ECR plasma source ion implantation under high vacuum conditions
1998, Vol. 70, Issue 6, pp. 1199-1202 [Details] [Full text - pdf 285 kB]
R. Lamendola and R. d’Agostino
Process control of organosilicon plasmas for barrier film preparations
1998, Vol. 70, Issue 6, pp. 1203-1208 [Details] [Full text - pdf 478 kB]
J. Mostaghimi
Modeling droplet impact in plasma spray processes
1998, Vol. 70, Issue 6, pp. 1209-1215 [Details] [Full text - pdf 515 kB]
O. P. Solonenko
Eulerain and Lagrangian modelling of dust-laden plasma jets
1998, Vol. 70, Issue 6, pp. 1217-1222 [Details] [Full text - pdf 580 kB]
J. A. Bakken, Roar Jensen, B. Monsen, O. Raaness and A. N. Wærnes
Thermal plasma process development in Norway
1998, Vol. 70, Issue 6, pp. 1223-1228 [Details] [Full text - pdf 560 kB]