CrossRef enabled

PAC Archives

Archive →

Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1151-1156

Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry

G. H. P. M. Swinkels, E. Stoffels, W. W. Stoffels, N. Simons, G. M. W. Kroesen and F. J. de Hoog

First page:
First page image