Author detail
Articles by R. d’Agostino
- Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges
- Process control of organosilicon plasmas for barrier film preparations
- Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
- The chemistry of etching and deposition processes
- Chemistry of titanium dry etching in fluorinated and chlorinated gases
- Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
Coauthors
- F. Fracassi (3 articles)
- R. Lamendola (2 articles)
- P. Favia (2 articles)
- F. Cramarossa (1 article)
- G. Bruno (1 article)
- P. Capezzuto (1 article)
- G. Cicala (1 article)
- F. Palumbo (1 article)
- A. Milella (1 article)
Affiliations
- Dipartimento di Chimica, Università degli Studi di Bari, via Orabona 4, 70126 Bari, Italy