Pure Appl. Chem., 2008, Vol. 80, No. 9, pp. 1919-1930
http://dx.doi.org/10.1351/pac200880091919
Radio frequency expanding plasmas at low, intermediate, and atmospheric pressure and their applications
Abstract:
We report on the operation and characteristics of radio frequency (RF) plasma beam sources based on the expansion of the discharge outside of limited spaces with small interelectrode gaps. The appropriate electrode configuration, combined with high mass flow values and appropriate power levels, leads to small- or large-size plasma jets, working stably at low, intermediate, and atmospheric pressures. The sources are promising tools for a wide range of applications in thin film deposition, surface modification, and cleaning, including the case of temperature-sensitive substrates.
Keywords
atmospheric-pressure plasma; plasma cleaning; plasma sources; radio frequency plasma jets; surface modification.