1988, Vol. 60, Issue 5
Eighth International Symposium on Plasma Chemistry, Tokyo, Japan, 31 August–4 September 1987
This conference is part of the Plasma Chemistry series.
Control and diagnostics of reactive plasma by photochemical and photoionization techniques
p. 587 [Details] [Full text - pdf 208 kB]
Thermal plasma processing in the nineties
p. 591 [Details] [Full text - pdf 1127 kB]
Plasma deposition and properties of composite metal/polymer and metal/hard carbon films
p. 607 [Details] [Full text - pdf 1390 kB]
Industrial-worthy plasma torches: State-of-the-art
p. 619 [Details] [Full text - pdf 2639 kB]
Plasma deposition of amorphous silicon films: an overview on some open questions
p. 633 [Details] [Full text - pdf 783 kB]
Mechanism of the ozone formations in a near liquid nitrogen temperature medium pressure glow discharge positive column
p. 645 [Details] [Full text - pdf 345 kB]
Particle heating in a thermal plasma
p. 651 [Details] [Full text - pdf 823 kB]
Impulse corona simulation for flue gas treatment
p. 663 [Details] [Full text - pdf 758 kB]
Diagnostics of thermal plasma
p. 675 [Details] [Full text - pdf 624 kB]
Inductively coupled plasmas in analytical atomic spectrometry: excitation mechanisms and analytical feasibilities
p. 685 [Details] [Full text - pdf 817 kB]
Plasma polymerization of unsaturated alcohols for deposition of hydrophilic thin film
p. 697 [Details] [Full text - pdf 426 kB]
Plasma and gaseous etching of compounds of Groups III-V
p. 703 [Details] [Full text - pdf 584 kB]
Processing of a thermal plasma flow in a tube
p. 709 [Details] [Full text - pdf 278 kB]
High Tc superconducting oxide films prepared by sputtering
p. 715 [Details] [Full text - pdf 695 kB]
Plasma reactors for process metallurgy applications
p. 721 [Details] [Full text - pdf 407 kB]
Pulse corona induced plasma chemical process: a horizon of new plasma chemical technologies
p. 727 [Details] [Full text - pdf 766 kB]
Amorphous Si and Si-based alloys from glow-discharge plasma
p. 733 [Details] [Full text - pdf 489 kB]
Behaviour of NOx in air-fed ozonizers
p. 741 [Details] [Full text - pdf 321 kB]
Excited states of plasmas for steel surface nitriding and TiN deposition
p. 747 [Details] [Full text - pdf 290 kB]
Mechanisms of decomposition of hydrocarbons in electrical discharges
p. 753 [Details] [Full text - pdf 1119 kB]
Diagnostics and control of low pressure plasmas for the chemical vapor deposition (CVD) of amorphous semiconductor and insulator films
p. 769 [Details] [Full text - pdf 1023 kB]
Ionized cluster beam (ICB) deposition and processes
p. 781 [Details] [Full text - pdf 2029 kB]
Expanding plasma used for plasma deposition
p. 795 [Details] [Full text - pdf 960 kB]
Arc discharge and electrode phenomena
p. 809 [Details] [Full text - pdf 1682 kB]
Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films
p. 815 [Details] [Full text - pdf 515 kB]