Pure Appl. Chem., 1985, Vol. 57, No. 9, pp. 1287-1298
http://dx.doi.org/10.1351/pac198557091287
Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
Individual author index pages
Other PAC articles by these authors
Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges
Process control of organosilicon plasmas for barrier film preparations
Plasmasurface interactions in the processing of iiiv semiconductor
materials
Plasma deposition of amorphous silicon alloys from fluorinated gases
Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
The chemistry of etching and deposition processes
Novel approaches to plasma deposition of amorphous silicon-based materials
Chemistry of titanium dry etching in fluorinated and chlorinated gases
Plasma deposition of amorphous silicon films: an overview on some open questions