Ninth International Symposium on Plasma Chemistry, Pugnochiuso, Italy, 4–8 September 1989
This conference is part of the Plasma Chemistry series.
Elementary processes in chemical dynamics
Chemical properties of small silicon clusters
Plasma deposition of semiconductor multilayer structures
Silent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiation
Effects of chemical reactions in arcs
Deposition of amorphous silicon alloys
A growth mechanism for the vacuum deposition of polymeric materials
Plasma etching and modification of organic polymers
Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas
Electron energy distribution functions in processing plasmas
Modelling of chemical reactions under nonequilibrium halogenated electrical discharge conditions
Plasma and nitrides: application to the nitriding of titanium
ECR (electron cyclotron resonance) plasma for thin film technology
The effect of non-reactive ions on the properties of PECVD (plasma enhanced chemical vapor deposition) TEOS (tetraethoxysilane) oxides
Metallurgy of open-bath plasma processes
Properties of coatings and applications of low pressure plasma spray
Complex investigation of thermophysical processes in plasma-jet spraying
Plasma spraying as an advanced tool in surface engineering
Plasma synthesis of ceramic powders
Some aspects of the generalization of electric arc characteristics
Plasma spray consolidation of materials
Measurements of nonequilibrium effects in thermal plasmas