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1990, Vol. 62, Issue 9

Ninth International Symposium on Plasma Chemistry, Pugnochiuso, Italy, 4–8 September 1989

This conference is part of the Plasma Chemistry series.
Plenary Lectures
Elementary processes in chemical dynamics
G. G. Volpi
p. 1649 [Details] [Full text - pdf 211 kB]
Chemical properties of small silicon clusters
M. L. Mandich, W. D. Reents, Jr. and K. D. Kolenbrander
p. 1653 [Details] [Full text - pdf 674 kB]
Plasma deposition of semiconductor multilayer structures
Masataka Hirose and S. Miyazaki
p. 1661 [Details] [Full text - pdf 405 kB]
Silent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiation
U. Kogelschatz
p. 1667 [Details] [Full text - pdf 880 kB]
Effects of chemical reactions in arcs
H. H. Maecker
p. 1675 [Details] [Full text - pdf 943 kB]
Invited Lectures

Topical lectures: cold plasma
Deposition of amorphous silicon alloys
J. Perrin
p. 1681 [Details] [Full text - pdf 708 kB]
A growth mechanism for the vacuum deposition of polymeric materials
H. K. Yasuda, Y. S. Yeh and S. Fusselman
p. 1689 [Details] [Full text - pdf 790 kB]
Plasma etching and modification of organic polymers
F. D. Egitto
p. 1699 [Details] [Full text - pdf 698 kB]
Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas
D. L. Flamm
p. 1709 [Details] [Full text - pdf 851 kB]
Electron energy distribution functions in processing plasmas
N. St. J. Braithwaite
p. 1721 [Details] [Full text - pdf 691 kB]
Modelling of chemical reactions under nonequilibrium halogenated electrical discharge conditions
D. I. Slovetsky
p. 1729 [Details] [Full text - pdf 1064 kB]
Plasma and nitrides: application to the nitriding of titanium
A. Gicquel, N. Laidani and P. Saillard
p. 1743 [Details] [Full text - pdf 766 kB]
ECR (electron cyclotron resonance) plasma for thin film technology
S. Nakayama
p. 1751 [Details] [Full text - pdf 1239 kB]
The effect of non-reactive ions on the properties of PECVD (plasma enhanced chemical vapor deposition) TEOS (tetraethoxysilane) oxides
A. S. Harrus, G. W. Hills and M. J. Thoma
p. 1757 [Details] [Full text - pdf 1234 kB]
Topical lectures: thermal plasma
Metallurgy of open-bath plasma processes
N. A. Barcza, T. R. Curr and R. T. Jones
p. 1761 [Details] [Full text - pdf 676 kB]
Properties of coatings and applications of low pressure plasma spray
K. Takeda, M. Ito and S. Takeuchi
p. 1773 [Details] [Full text - pdf 3009 kB]
Complex investigation of thermophysical processes in plasma-jet spraying
O. P. Solonenko
p. 1783 [Details] [Full text - pdf 1389 kB]
Plasma spraying as an advanced tool in surface engineering
H.-D. Steffens and M. Mack
p. 1801 [Details] [Full text - pdf 687 kB]
Plasma synthesis of ceramic powders
P. C. Kong and Y. C. Lau
p. 1809 [Details] [Full text - pdf 1401 kB]
Some aspects of the generalization of electric arc characteristics
O. I. Yas’ko
p. 1817 [Details] [Full text - pdf 597 kB]
Plasma spray consolidation of materials
R. W. Smith and D. Apelian
p. 1825 [Details] [Full text - pdf 3041 kB]
Measurements of nonequilibrium effects in thermal plasmas
C. H. Kruger, T. Owano and M. Gordon
p. 1833 [Details] [Full text - pdf 399 kB]

IUPAC Technical Reports and Recommendations

Polarographic half-wave potentials of cations in nonaqueous solvents
G. Gritzner
p. 1839 [Details] [Full text - pdf 867 kB]