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Pure Appl. Chem., 2010, Vol. 82, No. 6, pp. 1301-1315

Published online 2010-05-04

Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas

Luc Stafford1*, Joydeep Guha2,3, Rohit Khare2, Stefano Mattei1, Olivier Boudreault1, Boris Clain1 and Vincent M. Donnelly2

1 Department of Physics, University of Montréal, Montréal, Québec, H3C 3J7, Canada
2 Department of Chemical and Biomolecular Engineering, University of Houston, Houston, TX 77204, USA
3 Lam Research Corporation, Fremont, CA 94538, USA

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V. M. Donnelly, I. P. Herman, C. C. Cheng and K. V. Guinn
Surface chemistry during plasma etching of silicon
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