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Pure Appl. Chem., 2002, Vol. 74, No. 9, pp. 1519-1526

http://dx.doi.org/10.1351/pac200274091519

Structural variations in nanocrystalline nickel films

Pratibha L. Gai1,2*, Rahul Mitra3,4 and Julia R. Weertman3

1 DuPont, Central Research, Experimental Station, Wilmington, DE 19880-0356, USA
2 University of Delaware, Department of Materials Science and Engineering, Newark, DE 19716, USA
3 Northwestern University, Department of Materials Science, Evanston, IL 60208, USA
4 Defence Metallurgical Research Laboratory, Hyderabad, India

Abstract: Nanocrystalline nickel films of technological importance have been grown on various liquid nitrogen-cooled substrates by magnetron sputtering with and without a substrate bias. The atomic structural and chemical studies have unveiled variations in inter- and intragranular structures under the different process conditions. The origin and the development of the crystallization process with and without the substrate bias voltage have been inferred from the results.

Conference

2nd IUPAC Workshop on Advanced Materials (WAM II), Bangalore, India, 13–16 February 2002
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Cited by 3 articles Other PAC articles by these authors