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Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 471-474

Plasma synthesis of catalytic thin films

A.-L. Thomann1*, J. P. Rozenbaum1, P. Brault1, C. Andreazza2, P. Andreazza2, B. Rousseau2, H. Estrade-Szwarckopf2, A. Berthet3, J. C. Bertolini3, F. J. Cadete Santos Aires3, F. Monnet3, C. Mirodatos3, C. Charles4 and R. Boswell4

1 GREMI UMR 6606 CNRS, Université d'Orléans BP 6744 ORLEANS Cedex 2, France
2 CRMD, UMR 6619 CNRS, 45067 ORLEANS Cedex 2, France
3 IRC UPR 5401 CNRS, Av. A. Einstein; F-69626 VILLEURBANNE Cedex, France
4 Space Plasma and Plasma Processing, Plasma Research Laboratory, The Australian National University, Canberra ACT 0200, Australia

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Other PAC articles by these authors

Christine Charles
Role of ions in SiO2 deposition with pulsed and continuous helicon plasmas
2002, Vol. 74, Issue 3, pp. 401-405 [Details + Abstract] [Full text - pdf 212 kB]