Pure and Applied Chemistry, 2002, Volume 74, No. 3, pp. 435-439, Other PAC articles by these authors

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Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 435-439

http://dx.doi.org/10.1351/pac200274030435

Nonthermal and nonequilibrium effects in high-power pulsed ICP and application to surface modification of materials

T. Ishigaki¹*, N. Okada¹, N. Ohashi¹, H. Haneda¹ and T. Sakuta²

¹ Advanced Materials Laboratory, National Institute for Materials Science, Namiki 1-1, Tsukuba, Ibaraki 305-0044, Japan
² Department of Electrical and Electronic Engineering, Kanazawa University, Kodatsuno, Kanazawa, Ishikawa 920-0942, Japan

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Nonthermal and nonequilibrium effects in high-power pulsed ICP and application to surface modification of materials

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