Pure and Applied Chemistry, 2002, Volume 74, No. 3, pp. 369-380, Other PAC articles by these authors

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Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 369-380

http://dx.doi.org/10.1351/pac200274030369

Plasma processing and chemistry

Daniel C. Schram

Eindhoven University of Technology, Department of Physics, P.O. Box 513, 5600 MB Eindhoven, The Netherlands

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Daniel C. Schram

Other PAC articles by these authors

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