Pure and Applied Chemistry

Author detail

Articles by Daniel C. Schram

• Daniel C. Schram

  Plasma processing and chemistry

  2002, Vol. 74, Issue 3, pp. 369-380 [Details + Abstract] [Full text - pdf 291 kB]

The following name might also represent this author:

D. C. Schram

• M. C. M. van de Sanden, J. W. A. M. Gielen, R. J. Severens, R. M. J. Paffen and D. C. Schram

  Fast deposition of thin amorphous layers using an expanding thermal plasma

  1996, Vol. 68, Issue 5, pp. 1155-1158 [Details] [Full text - pdf 347 kB]
• D. C. Schram, J. A. M. van der Mullen and M. C. M. van de Sanden

  The diagnostics of thermal plasmas

  1992, Vol. 64, Issue 5, pp. 645-652 [Details] [Full text - pdf 638 kB]
• G. M. W. Kroesen, C. J. Timmermans and D. C. Schram

  Expanding plasma used for plasma deposition

  1988, Vol. 60, Issue 5, pp. 795-808 [Details] [Full text - pdf 960 kB]

Affiliations

• Eindhoven University of Technology, Department of Physics, P.O. Box 513, 5600 MB Eindhoven, The Netherlands