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Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1203-1208

Process control of organosilicon plasmas for barrier film preparations

R. Lamendola and R. d’Agostino

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Other PAC articles by these authors

A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino
Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges
2005, Vol. 77, Issue 2, pp. 399-414 [Details + Abstract] [Full text - pdf 968 kB]
P. Favia, R. d’Agostino and F. Fracassi
Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers
1994, Vol. 66, Issue 6, pp. 1373-1380 [Details] [Full text - pdf 534 kB]
R. d’Agostino, F. Fracassi and R. Lamendola
The chemistry of etching and deposition processes
1994, Vol. 66, Issue 6, pp. 1185-1193 [Details] [Full text - pdf 591 kB]
F. Fracassi and R. d’Agostino
Chemistry of titanium dry etching in fluorinated and chlorinated gases
1992, Vol. 64, Issue 5, pp. 703-707 [Details] [Full text - pdf 400 kB]
R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa
Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
1985, Vol. 57, Issue 9, pp. 1287-1298 [Details] [Full text - pdf 210 kB]