Pure and Applied Chemistry, 1998, Volume 70, No. 6, pp. 1181-1186, Other PAC articles by these authors

PAC → Archive → Vol. 70 (1998) → Issue 6 → Plasmasurface interactions in the processing… → Other PAC articles by these authors

Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1181-1186

http://dx.doi.org/10.1351/pac199870061181

Plasmasurface interactions in the processing of iiiv semiconductor materials

M. Losurdo, P. Capezzuto and G. Bruno

G. Cicala, G. Bruno and P. Capezzuto

Plasma deposition of amorphous silicon alloys from fluorinated gases

G. Bruno, P. Capezzuto and G. Cicala

Novel approaches to plasma deposition of amorphous silicon-based materials

P. Capezzuto and G. Bruno

Plasma deposition of amorphous silicon films: an overview on some open questions

R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges