Pure and Applied Chemistry, 1998, Volume 70, No. 6, pp. 1151-1156, Other PAC articles by these authors

Pure Appl. Chem., 1998, Vol. 70, No. 6, pp. 1151-1156

http://dx.doi.org/10.1351/pac199870061151

Treatment of dust particles in an RF plasma monitored by Mie scattering rotating compensator ellipsometry

G. H. P. M. Swinkels, E. Stoffels, W. W. Stoffels, N. Simons, G. M. W. Kroesen and F. J. de Hoog

W. W. Stoffels, A. J. Flikweert, T. Nimalasuriya, J. J. A. M. van der Mullen, G. M. W. Kroesen and M. Haverlag

Metal halide lamps: Gravitational influence on color separation

A. Bouchoule, L. Boufendi, J. Hermann, A. Plain, T. Hbid, G. Kroesen, E. Stoffels and W. W. Stoffels

Formation of dense submicronic clouds in low pressure Ar-SiH₄ RF reactor: Diagnostics and growth processes from monomers to large size particulates

G. M. W. Kroesen, C. J. Timmermans and D. C. Schram

Expanding plasma used for plasma deposition

T. J. Bisschops and F. J. de Hoog

On the plasmaphysics of plasma-etching