Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1159-1165
http://dx.doi.org/10.1351/pac199668051159
Plasma processing of dusts and residues
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Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1159-1165
http://dx.doi.org/10.1351/pac199668051159