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Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1143-1149

Plasma deposition of amorphous silicon alloys from fluorinated gases

G. Cicala, G. Bruno and P. Capezzuto

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Other PAC articles by these authors

A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino
Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges
2005, Vol. 77, Issue 2, pp. 399-414 [Details + Abstract] [Full text - pdf 968 kB]
M. Losurdo, P. Capezzuto and G. Bruno
Plasmasurface interactions in the processing of iiiv semiconductor materials
1998, Vol. 70, Issue 6, pp. 1181-1186 [Details] [Full text - pdf 553 kB]
G. Bruno, P. Capezzuto and G. Cicala
Novel approaches to plasma deposition of amorphous silicon-based materials
1992, Vol. 64, Issue 5, pp. 725-730 [Details] [Full text - pdf 537 kB]
P. Capezzuto and G. Bruno
Plasma deposition of amorphous silicon films: an overview on some open questions
1988, Vol. 60, Issue 5, pp. 633-644 [Details] [Full text - pdf 783 kB]
R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa
Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges
1985, Vol. 57, Issue 9, pp. 1287-1298 [Details] [Full text - pdf 210 kB]