Pure and Applied Chemistry, 1996, Volume 68, No. 5, pp. 1143-1149, Other PAC articles by these authors

PAC → Archive → Vol. 68 (1996) → Issue 5 → Plasma deposition of amorphous silicon… → Other PAC articles by these authors

Pure Appl. Chem., 1996, Vol. 68, No. 5, pp. 1143-1149

http://dx.doi.org/10.1351/pac199668051143

Plasma deposition of amorphous silicon alloys from fluorinated gases

G. Cicala, G. Bruno and P. Capezzuto

A. Milella, F. Palumbo, P. Favia, G. Cicala and R. d’Agostino

Deposition mechanism of nanostructured thin films from tetrafluoroethylene glow discharges

M. Losurdo, P. Capezzuto and G. Bruno

Plasmasurface interactions in the processing of iiiv semiconductor materials

G. Bruno, P. Capezzuto and G. Cicala

Novel approaches to plasma deposition of amorphous silicon-based materials

P. Capezzuto and G. Bruno

Plasma deposition of amorphous silicon films: an overview on some open questions

R. d’Agostino, P. Capezzuto, G. Bruno and F. Cramarossa

Mechanism of etching, polymerization and deposition in R.F. (radio frequency) discharges