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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1373-1380

http://dx.doi.org/10.1351/pac199466061373

Plasma and surface diagnostics in PECVD (plasma-enhanced chemical vapor deposition) from silicon containing organic monomers

P. Favia, R. d’Agostino and F. Fracassi

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