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Pure Appl. Chem., 1994, Vol. 66, No. 6, pp. 1343-1352

http://dx.doi.org/10.1351/pac199466061343

Processing of electronic materials by microwave plasma

M. R. Wertheimer and M. Moisan

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M. Nantel-Valiquette, Y. Kabouzi, E. CastaƱos-Martinez, K. Makasheva, M. Moisan and J. C. Rostaing
Reduction of perfluorinated compound emissions using atmospheric pressure microwave plasmas: Mechanisms and energy efficiency
2006, Vol. 78, Issue 6, pp. 1173-1185 [Details + Abstract] [Full text - pdf 223 kB]
M. R. Wertheimer, H. R. Thomas, M. J. Perri, J. E. Klemberg-Sapieha and L. Martinu
Plasmas and polymers: From laboratory to large scale commercialization
1996, Vol. 68, Issue 5, pp. 1047-1053 [Details] [Full text - pdf 1016 kB]
M. R. Wertheimer, M. Moisan, J. E. Klemberg-Sapieha and R. Claude
Effect of frequency from 'low frequency' to microwave on the plasma deposition of thin films
1988, Vol. 60, Issue 5, pp. 815-820 [Details] [Full text - pdf 515 kB]