Pure and Applied Chemistry, 1990, Volume 62, No. 9, pp. 1757-1760, Other PAC articles by these authors

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Pure Appl. Chem., 1990, Vol. 62, No. 9, pp. 1757-1760

http://dx.doi.org/10.1351/pac199062091757

The effect of non-reactive ions on the properties of PECVD (plasma enhanced chemical vapor deposition) TEOS (tetraethoxysilane) oxides

A. S. Harrus, G. W. Hills and M. J. Thoma

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