Pure Appl. Chem., 1990, Vol. 62, No. 9, pp. 1757-1760
http://dx.doi.org/10.1351/pac199062091757
The effect of non-reactive ions on the properties of PECVD (plasma enhanced chemical vapor deposition) TEOS (tetraethoxysilane) oxides
First page:
Pure Appl. Chem., 1990, Vol. 62, No. 9, pp. 1757-1760
http://dx.doi.org/10.1351/pac199062091757