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Ninth International Symposium on Plasma Chemistry, Pugnochiuso, Italy, 4–8 September 1989

This conference is part of the Plasma Chemistry series.
G. G. Volpi
Elementary processes in chemical dynamics
1990, Vol. 62, Issue 9, pp. 1649-1651 [Details] [Full text - pdf 211 kB]
M. L. Mandich, W. D. Reents, Jr. and K. D. Kolenbrander
Chemical properties of small silicon clusters
1990, Vol. 62, Issue 9, pp. 1653-1660 [Details] [Full text - pdf 674 kB]
Masataka Hirose and S. Miyazaki
Plasma deposition of semiconductor multilayer structures
1990, Vol. 62, Issue 9, pp. 1661-1666 [Details] [Full text - pdf 405 kB]
U. Kogelschatz
Silent discharges for the generation of ultraviolet and vacuum ultraviolet excimer radiation
1990, Vol. 62, Issue 9, pp. 1667-1674 [Details] [Full text - pdf 880 kB]
H. H. Maecker
Effects of chemical reactions in arcs
1990, Vol. 62, Issue 9, pp. 1675-1680 [Details] [Full text - pdf 943 kB]
J. Perrin
Deposition of amorphous silicon alloys
1990, Vol. 62, Issue 9, pp. 1681-1688 [Details] [Full text - pdf 708 kB]
H. K. Yasuda, Y. S. Yeh and S. Fusselman
A growth mechanism for the vacuum deposition of polymeric materials
1990, Vol. 62, Issue 9, pp. 1689-1698 [Details] [Full text - pdf 790 kB]
F. D. Egitto
Plasma etching and modification of organic polymers
1990, Vol. 62, Issue 9, pp. 1699-1708 [Details] [Full text - pdf 698 kB]
D. L. Flamm
Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas
1990, Vol. 62, Issue 9, pp. 1709-1720 [Details] [Full text - pdf 851 kB]
N. St. J. Braithwaite
Electron energy distribution functions in processing plasmas
1990, Vol. 62, Issue 9, pp. 1721-1728 [Details] [Full text - pdf 691 kB]
D. I. Slovetsky
Modelling of chemical reactions under nonequilibrium halogenated electrical discharge conditions
1990, Vol. 62, Issue 9, pp. 1729-1742 [Details] [Full text - pdf 1064 kB]
A. Gicquel, N. Laidani and P. Saillard
Plasma and nitrides: application to the nitriding of titanium
1990, Vol. 62, Issue 9, pp. 1743-1750 [Details] [Full text - pdf 766 kB]
S. Nakayama
ECR (electron cyclotron resonance) plasma for thin film technology
1990, Vol. 62, Issue 9, pp. 1751-1756 [Details] [Full text - pdf 1239 kB]
A. S. Harrus, G. W. Hills and M. J. Thoma
The effect of non-reactive ions on the properties of PECVD (plasma enhanced chemical vapor deposition) TEOS (tetraethoxysilane) oxides
1990, Vol. 62, Issue 9, pp. 1757-1760 [Details] [Full text - pdf 1234 kB]
N. A. Barcza, T. R. Curr and R. T. Jones
Metallurgy of open-bath plasma processes
1990, Vol. 62, Issue 9, pp. 1761-1772 [Details] [Full text - pdf 676 kB]
K. Takeda, M. Ito and S. Takeuchi
Properties of coatings and applications of low pressure plasma spray
1990, Vol. 62, Issue 9, pp. 1773-1782 [Details] [Full text - pdf 3009 kB]
O. P. Solonenko
Complex investigation of thermophysical processes in plasma-jet spraying
1990, Vol. 62, Issue 9, pp. 1783-1800 [Details] [Full text - pdf 1389 kB]
H.-D. Steffens and M. Mack
Plasma spraying as an advanced tool in surface engineering
1990, Vol. 62, Issue 9, pp. 1801-1808 [Details] [Full text - pdf 687 kB]
P. C. Kong and Y. C. Lau
Plasma synthesis of ceramic powders
1990, Vol. 62, Issue 9, pp. 1809-1816 [Details] [Full text - pdf 1401 kB]
O. I. Yas’ko
Some aspects of the generalization of electric arc characteristics
1990, Vol. 62, Issue 9, pp. 1817-1824 [Details] [Full text - pdf 597 kB]
R. W. Smith and D. Apelian
Plasma spray consolidation of materials
1990, Vol. 62, Issue 9, pp. 1825-1832 [Details] [Full text - pdf 3041 kB]
C. H. Kruger, T. Owano and M. Gordon
Measurements of nonequilibrium effects in thermal plasmas
1990, Vol. 62, Issue 9, pp. 1833-1838 [Details] [Full text - pdf 399 kB]