CrossRef enabled

PAC Archives

Archive →

Pure Appl. Chem., 1990, Vol. 62, No. 9, pp. 1751-1756

http://dx.doi.org/10.1351/pac199062091751

ECR (electron cyclotron resonance) plasma for thin film technology

S. Nakayama

CrossRef Cited-by theme picture

CrossRef Cited-by Linking

  • Abu Samra H., Kumar A., Xia J., Staedler T., Jiang X.: Development of a new generation of amorphous hard coatings based on the Si–B–C–N–O system for applications in extreme conditions. Surface and Coatings Technology 2013, 223, 52. <http://dx.doi.org/10.1016/j.surfcoat.2013.02.028>
  • Ball Jeremy, Bowen Leon, Mendis Budhika G., Reehal H. S.: Low pressure plasma assisted silicon nanowire growth from self organised tin catalyst particles. CrystEngComm 2013, 15, 3808. <http://dx.doi.org/10.1039/c3ce00036b>
  • Abu Samra H., Staedler T., Aronov I., Xia J., Jia C., Wenclawiak B., Jiang X.: Deposition and characterisation of nanocrystalline Mo2N/BN composite coatings by ECR plasma assisted CVD. Surface Coatings and Technology 2010, 204, 1919. <http://dx.doi.org/10.1016/j.surfcoat.2009.11.016>
  • Volpe Pierre-Nicolas, Muret Pierre, Omnes Franck: Effect of ECR etching conditions of (100)Ib diamond substrates on homoepitaxial low boron doped diamond layer quality. phys stat sol (a) 2008, 205, 2173. <http://dx.doi.org/10.1002/pssa.200879724>