Pure Appl. Chem., 1990, Vol. 62, No. 9, pp. 1709-1720
http://dx.doi.org/10.1351/pac199062091709
Mechanisms of silicon etching in fluorine- and chlorine-containing plasmas
First page:
![First page image](/publications/pac/pdf/first_pages/6209x1709.jpg)
Pure Appl. Chem., 1990, Vol. 62, No. 9, pp. 1709-1720
http://dx.doi.org/10.1351/pac199062091709