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Pure Appl. Chem., 1990, Vol. 62, No. 9, pp. 1699-1708

Plasma etching and modification of organic polymers

F. D. Egitto

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  • Chung Ting-Ying, Ning Ning, Chu Jhih-Wei, Graves David B., Bartis Elliot, Joonil Seog, Oehrlein Gottlieb S.: Plasma Deactivation of Endotoxic Biomolecules: Vacuum Ultraviolet Photon and Radical Beam Effects on Lipid A. Plasma Processes Polym. 2013, 10, 167. <>
  • Ren Xianwen, Weng Lu-Tao, Ng Kai-Mo, Chan Chi-Ming: Effects of Ar- and Ar/O2 -plasma-treated amorphous and crystalline polymer surfaces revealed by ToF-SIMS and principal component analysis. Surf. Interface Anal. 2013, 45, 1158. <>
  • Peng Jr-Wei, Lee Szetsen: Atmospheric Pressure Plasma Degradation of Azo Dyes in Water: pH and Structural Effects. Plasma Chem Plasma Process 2013, 33, 1063. <>
  • Girard A., Geneste F., Coulon N., Cardinaud C., Mohammed-Brahim T.: SiGe derivatization by spontaneous reduction of aryl diazonium salts. Applied Surface Science 2013, 282, 146. <>
  • Prakash Ravi, Papageorgiou Dimitrios P., Papathanasiou Athanasios G., Kaler Karan V.I.S.: Dielectrophoretic liquid actuation on nano-textured super hydrophobic surfaces. Sensors and Actuators B: Chemical 2013, 182, 351. <>
  • Baklanov Mikhail R., de Marneffe Jean-Francois, Shamiryan Denis, Urbanowicz Adam M., Shi Hualiang, Rakhimova Tatyana V., Huang Huai, Ho Paul S.: Plasma processing of low-k dielectrics. J. Appl. Phys. 2013, 113, 041101. <>
  • Nabesawa Hirofumi, Hiruma Takaharu, Hitobo Takeshi, Wakabayashi Suguru, Asaji Toyohisa, Abe Takashi, Seki Minoru: Low-pressure plasma-etching of bulk polymer materials using gas mixture of CF4 and O2. AIP Advances 2013, 3, 112105. <>
  • Fahmy Alaa, Friedrich Jörg: Degradation behavior of thin polystyrene films on exposure to Ar plasma and its emitted radiation. Journal of Adhesion Science and Technology 2013, 27, 324. <>
  • Dufour T, Hubert J, Vandencasteele N, Viville P, Lazzaroni R, Reniers F: Competitive and synergistic effects between excimer VUV radiation and O radicals on the etching mechanisms of polyethylene and fluoropolymer surfaces treated by an atmospheric He–O2post-discharge. J. Phys. D: Appl. Phys. 2013, 46, 315203. <>
  • Petti Lucia, Rippa Massimo, Capasso Rossella, Nenna Giuseppe, Mauro Anna De Girolamo Del, Maglione Maria Grazia, Minarini Carla: Novel organic LED structures based on a highly conductive polymeric photonic crystal electrode. Nanotechnology 2013, 24, 315206. <>
  • Mansoor I, Liu Y, Häfeli U O, Stoeber B: Arrays of hollow out-of-plane microneedles made by metal electrodeposition onto solvent cast conductive polymer structures. J. Micromech. Microeng. 2013, 23, 085011. <>
  • Conway J, Kechkar S, O' Connor N, Gaman C, Turner M M, Daniels S: Use of particle-in-cell simulations to improve the actinometry technique for determination of absolute atomic oxygen density. Plasma Sources Sci. Technol. 2013, 22, 045004. <>
  • Petti L., Rippa M., Capasso R., Nenna G., De Girolamo Del Mauro A., La Ferrara V., Pacheri Madathil A., Minarini C.: Photonic crystal electrode to be used in organic LED structures. JEOS:RP 2013, 8. <>
  • Dal'Maz Silva Walter, Belmonte Thierry, Duday David, Frache Gilles, Noël Cedric, Choquet Patrick, Migeon Henri-Noel, Maliska Ana Maria: Interaction Mechanisms between ArO2 Post-discharge and Biphenyl. Plasma Process Polym 2012, 9, 207. <>
  • Fricke K., Tresp H., Bussiahn R., Schröder K., Woedtke Th., Weltmann K.-D.: On the Use of Atmospheric Pressure Plasma for the Bio-Decontamination of Polymers and Its Impact on Their Chemical and Morphological Surface Properties. Plasma Chem Plasma Process 2012, 32, 801. <>
  • Ochoa Manuel, Mousoulis Charilaos, Ziaie Babak: Polymeric microdevices for transdermal and subcutaneous drug delivery. Advanced Drug Delivery Reviews 2012, 64, 1603. <>
  • Greer A.I.M., Moran D.A.J.: Charge dissipation layer optimisation for nano-scale electron-beam lithography pattern definition onto diamond. Diamond and Related Materials 2012, 29, 13. <>
  • Nazarpoor Zahra, Ma Shuguo, Fanson Paul T., Alexeev Oleg S., Amiridis Michael D.: Decomposition of poly(amidoamine) (PAMAM) dendrimers under O2 plasma conditions. Polym Deg Stabil 2012, 97, 439. <>
  • VÉLEZ-GARCÍA G.M., WAPPEROM P., KUNC V., BAIRD D.G., ZINK-SHARP A.: Sample preparation and image acquisition using optical-reflective microscopy in the measurement of fiber orientation in thermoplastic composites. Journal of Microscopy 2012, 248, 23. <>
  • Ryu Ilhwan, Hong Dajung, Yim Sanggyu: Effective surface oxidation of polymer replica molds for nanoimprint lithography. Nanoscale Res Lett 2012, 7, 39. <>
  • Fricke Katja, Steffen Hartmut, von Woedtke Thomas, Schröder Karsten, Weltmann Klaus-Dieter: High Rate Etching of Polymers by Means of an Atmospheric Pressure Plasma Jet. Plasma Process Polym 2011, 8, 51. <>
  • Bernardelli E. A., Belmonte T., Duday D., Frache G., Poncin-Epaillard F., Noël C., Choquet P., Migeon H.-N., Maliska A.: Interaction Mechanisms Between Ar–O2 Post-Discharge and Stearic Acid I: Behaviour of Thin Films. Plasma Chem Plasma Process 2011, 31, 189. <>
  • Chuang Miao-Ju, Chu Ann-Kuo: Formation of a high hydrophilic/hydrophobic contrast surface on PET substrates by ECR generated sulfur hexafluoride plasma. Applied Surface Science 2011, 257, 3943. <>
  • Belmonte T., Bernardelli E.A., Mafra M., Duday D., Frache G., Poncin-Epaillard F., Noël C., Choquet P., Migeon H.-N., Maliska A.M.: Comparison between hexatriacontane and stearic acid behaviours under late Ar―O2 post-discharge. Surface and Coatings Technology 2011, 205, S443. <>
  • Mauter Meagan S., Wang Yue, Okemgbo Kaetochi C., Osuji Chinedum O., Giannelis Emmanuel P., Elimelech Menachem: Antifouling Ultrafiltration Membranes via Post-Fabrication Grafting of Biocidal Nanomaterials. MATER INTERF 2011, 3, 2861. <>
  • Scheen Gilles, Ziouche Katir, Bougrioua Zahia, Godts Pascale, Leclercq Didier, Lasri Tuami: Simultaneous Fabrication of Superhydrophobic and Superhydrophilic Polyimide Surfaces with Low Hysteresis. Langmiur 2011, 27, 6490. <>
  • Khaldi Alexandre, Plesse Cédric, Soyer Caroline, Cattan Eric, Vidal Frédéric, Legrand Christiane, Teyssié Dominique: Conducting interpenetrating polymer network sized to fabricate microactuators. Appl Phys Lett 2011, 98, 164101. <>
  • Chen Qianwen, Zhang Dingyou, Tan Zhimin, Wang Zheyao, Liu Litian, Lu Jian-Qiang: Thick benzocyclobutene etching using high density SF[sub 6]/O[sub 2] plasmas. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2011, 29, 011019. <>
  • Yang Yang, Strobel Mark, Kirk Seth, Kushner Mark J.: Fluorine Plasma Treatments of Poly(propylene) Films, 2 - Modeling Reaction Mechanisms and Scaling. Plasma Process Polym 2010, NA. <>
  • Fanelli Fiorenza, Fracassi Francesco, d'Agostino Riccardo: Deposition and etching of fluorocarbon thin films in atmospheric pressure DBDs fed with Ar–CF4–H2 and Ar–CF4–O2 mixtures. Surface Coatings and Technology 2010, 204, 1779. <>
  • Ham Yong-Hyun, Shutov Dmitriy Alexandrovich, Baek Kyu-Ha, Do Lee-Mi, Kim Kwangsoo, Lee Chi-Woo, Kwon Kwang-Ho: Surface characteristics of parylene-C films in an inductively coupled O2/CF4 gas plasma. This Solid Films 2010, 518, 6378. <>
  • Yung K. C., Liem H., Choy H. S., Zheng H. F., Yue T. M.: Multiresponse Optimization of Surface Plasma Treatment Using Taguchi Method. Mat Manuf Proc 2010, 25, 1001. <>
  • Colín E., Olayo M.G., Cruz G.J., Carapia L., Morales J., Olayo R.: Affinity of amine-functionalized plasma polymers with ionic solutions similar to those in the human body. Progress in Organic Coating 2009, 64, 322. <>
  • Gonzalez Eleazar, Barankin Michael D., Guschl Peter C., Hicks Robert F.: . IEEE Trans Plasma Sci 2009, 37, 823. <>
  • Mafra M., Belmonte T., Poncin-Epaillard F., Silva Sobrinho A. S., Maliska A.: Role of the Temperature on the Interaction Mechanisms Between Argon–Oxygen Post-Discharge and Hexatriacontane. Plasma Chem Plasma Process 2008, 28, 495. <>
  • Masaeli Elahe, Morshed Mohammad, Tavanai Hosein, Ashrafizadeh Fakhreddin: Effect of process variables on surface properties of low-pressure plasma treated polypropylene fibers. Fibers Polym 2008, 9, 461. <>
  • Kylián O, Rauscher H, Gilliland D, Brétagnol F, Rossi F: Removal of model proteins by means of low-pressure inductively coupled plasma discharge. J Phys D Appl Phys 2008, 41, 095201. <>
  • Masaeli E., Morshed M., Tavanai H.: Study of the wettability properties of polypropylene nonwoven mats by low-pressure oxygen plasma treatment. Surf Interface Anal 2007, 39, 770. <>
  • Valsesia Andrea, Meziani Tarik, Bretagnol Frédéric, Colpo Pascal, Ceccone Giacomo, Rossi François: Plasma assisted production of chemical nano-patterns by nano-sphere lithography: application to bio-interfaces. J Phys D Appl Phys 2007, 40, 2341. <>
  • Kuvaldina E. V., Shutov D. A.: Kinetic characteristics of the interaction of oxygen atoms with certain polymers. Surf Engin Appl Electrochem 2007, 43, 94. <>
  • Hody V., Belmonte T., Pintassilgo C. D., Poncin-Epaillard F., Czerwiec T., Henrion G., Segui Y., Loureiro J.: Modification of Hexatriacontane by O2–N2 Microwave Post-Discharges. Plasma Chem Plasma Process 2006, 26, 251. <>
  • Tabaliov N A, Svirachev D M: Treatment of polymer surfaces in plasma Part I. Kinetic model. J Phys Conf Ser 2006, 44, 146. <>
  • Ko Hyoung-Soo, Nah Jae-Woong, Paik Kyung W., Park Y.: Effects of the polymer residues on via contact resistance after reactive ion etching. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2002, 20, 1000. <>
  • Schröder K., Meyer-Plath A., Keller D., Besch W., Babucke G., Ohl A.: Plasma-Induced Surface Functionalization of Polymeric Biomaterials in Ammonia Plasma. Contrib Plasma Phys 2001, 41, 562. <<562::AID-CTPP562>3.0.CO;2-Y>
  • Callahan Russell R. A., Raupp Gregory B., Beaudoin Stephen P.: Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 2001, 19, 725. <>
  • Butoi Carmen I., Mackie Neil M., Williams Keri L., Capps Nathan E., Fisher Ellen R.: Ion and substrate effects on surface reactions of CF[sub 2] using C[sub 2]F[sub 6], C[sub 2]F[sub 6]/H[sub 2], and hexafluoropropylene oxide plasmas. J Vac Sci Technol A 2000, 18, 2685. <>
  • Ohl A, Schleinitz W, Meyer-Sievers A, Becker A, Keller D, Schröder K, Conrads J: Design of an UHV reactor system for plasma surface treatment of polymer materials. Surface and Coatings Technology 1999, 116-119, 1006. <>
  • Chan C.-M., Ko T.-M., Hiraoka H.: Polymer surface modification by plasmas and photons. Surf Sci Rep 1996, 24, 1. <>
  • Shi M. K., Martinu L., Sacher E., Selmani A., Wertheimer M. R., Yelon A.: Angle-resolved XPS study of plasma-treated teflon PFA surfaces. Surf Interface Anal 1995, 23, 99. <>
  • Koretsky Milo D., Reimer Jeffrey A.: A simple model for the etching of photoresist with plasma-generated reactants. J Appl Phys 1992, 72, 5081. <>
  • Coulon J.F., Turban G.: An XPS study of photoresist surfaces in SF6O2 r.f. plasmas. Mater Sei Eng A 1991, 139, 385. <>