Pure and Applied Chemistry

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• Barekzi Nazir, Laroussi Mounir: Effects of Low Temperature Plasmas on Cancer Cells. Plasma Process. Polym. 2013, 10, 1039. <http://dx.doi.org/10.1002/ppap.201300083>
• Akgün Ertan, Hubbuch Jürgen, Wörner Michael: Perspectives of aerosol-photopolymerization: Nanoscale polymer particles. Chemical Engineering Science 2013, 101, 248. <http://dx.doi.org/10.1016/j.ces.2013.06.010>
• Bendella S., Larouci B., Belasri A., Ait Kaci H., Bouziane Hammou A.: Modeling of Kr-Xe discharge of excimer lamp. EPJ Web of Conferences 2013, 44, 04004. <http://dx.doi.org/10.1051/epjconf/20134404004>
• Baadj S., Harrache Z., Belasri A.: Electrical and chemical properties of XeCl*(308 nm) exciplex lamp created by a dielectric barrier discharge. Plasma Phys. Rep. 2013, 39, 1043. <http://dx.doi.org/10.1134/S1063780X13120015>
• Mericam-Bourdet N., Kirkpatrick M.J., Tuvache F., Frochot D., Odic E.: Effect of voltage waveform on dielectric barrier discharge ozone production efficiency. Euro Phys J Appl Phys 2012, 57, 30801. <http://dx.doi.org/10.1051/epjap/2012110302>
• Lu X, Laroussi M, Puech V: On atmospheric-pressure non-equilibrium plasma jets and plasma bullets. Plasma Sources Sci Technol 2012, 21, 034005. <http://dx.doi.org/10.1088/0963-0252/21/3/034005>
• Pipa A. V., Bussiahn R.: Optimization of a Dielectric Barrier Discharge for Pulsed UV Emission of XeCl at 308 nm. Contrib Plasma Phys 2011, 51, 850. <http://dx.doi.org/10.1002/ctpp.201100011>
• Kersten Hendrik, Derpmann Valerie, Barnes Ian, Brockmann Klaus J., O’Brien Rob, Benter Thorsten: A Novel APPI-MS Setup for In Situ Degradation Product Studies of Atmospherically Relevant Compounds: Capillary Atmospheric Pressure Photo Ionization (cAPPI). j am soc mass spectr 2011, 22, 2070. <http://dx.doi.org/10.1007/s13361-011-0212-y>
• Dong Lifang, Li Xinchun, Lu Ning, Shang Jie, Liu Liang: Analysis of the structure of a cluster hexagon pattern in dielectric barrier discharge by FFT. Energy Procedia 2011, 13, 2127. <http://dx.doi.org/10.1016/j.egypro.2011.11.303>
• Ochiai Tsuyoshi, Niitsu Yasuji, Kobayashi Go, Kurano Masahiro, Serizawa Izumi, Horio Koji, Nakata Kazuya, Murakami Taketoshi, Morito Yuko, Fujishima Akira: Compact and effective photocatalytic air-purification unit by using of mercury-free excimer lamps with TiO2 coated titanium mesh filter. Catal Sci Technol 2011, 1, 1328. <http://dx.doi.org/10.1039/c1cy00270h>
• Sousa J. S., Niemi K., Cox L. J., Algwari Q. Th., Gans T., O’Connell D.: Cold atmospheric pressure plasma jets as sources of singlet delta oxygen for biomedical applications. J Appl Phys 2011, 109, 123302. <http://dx.doi.org/10.1063/1.3601347>
• Belasri A., Harrache Z.: Electrical and kinetical aspects of homogeneous dielectric-barrier discharge in xenon for excimer lamps. Phys Plasmas 2010, 17, 123501. <http://dx.doi.org/10.1063/1.3520368>
• Erofeev M V, Baksht E Kh, Tarasenko Viktor F, Shut'ko Yu V: Miniature UV lamp excited by subnanosecond voltage pulses. QUANTUM ELECTRON 2010, 40, 561. <http://dx.doi.org/10.1070/QE2010v040n06ABEH014336>
• Belasri A, Khodja K, Bendella S, Harrache Z: One-dimensional modelling of DBDs in Ne–Xe mixtures for excimer lamps. J Phys D Appl Phys 2010, 43, 445202. <http://dx.doi.org/10.1088/0022-3727/43/44/445202>
• Erofeev M V, Schitz D V, Skakun V S, Sosnin E A, Tarasenko V F: Compact dielectric barrier discharge excilamps. Phys Scr 2010, 82, 045403. <http://dx.doi.org/10.1088/0031-8949/82/04/045403>
• Capeillère J, Sewraj N, Ségur P, Bordage M-C, Marchal F: Particle transport in neutral xenon: 2D modelling approach for the contribution of recombination processes to VUV emissions. J Phys B At Mol Opt Phys 2010, 43, 085203. <http://dx.doi.org/10.1088/0953-4075/43/8/085203>
• Salvermoser M. J., Kogelschatz U., Murnick D. E.: Influence of humidity on photochemical ozone generation with 172 nm xenon excimer lamps. Eur Phys J AP 2009, 47, 22812. <http://dx.doi.org/10.1051/epjap/2009063>
• Volkova G. A., Zvereva G. N.: Current characteristics of barrier discharges in inert gases (Ar, Kr, Xe). Opt Spectrosc 2009, 106, 642. <http://dx.doi.org/10.1134/S0030400X09050038>
• Belasri A., Bendella S., Baba-Hamed T.: Study of the first pulse of Ne-Xe-HCl dielectric barrier discharge for the excimer lamp. Phys Plasmas 2008, 15, 053502. <http://dx.doi.org/10.1063/1.2907368>
• Nagel Matthias, Hany Roland, Lippert Thomas, Molberg Martin, Nüesch Frank A., Rentsch Daniel: Aryltriazene Photopolymers for UV-Laser Applications: Improved Synthesis and Photodecomposition Study. Macromol Chem Phys 2007, 208, 277. <http://dx.doi.org/10.1002/macp.200600492>
• Laroussi Mounir, Akan Tamer: Arc-Free Atmospheric Pressure Cold Plasma Jets: A Review. Plasma Process Polym 2007, 4, 777. <http://dx.doi.org/10.1002/ppap.200700066>
• Fang Hao Jie, Hou Hui Qi, Xia Lan Yan, Shu Xiao Hong, Zhang Ren Xi: A combined plasma photolysis (CPP) method for removal of CS2 from gas streams at atmospheric pressure. Chemosphere 2007, 69, 1734. <http://dx.doi.org/10.1016/j.chemosphere.2007.05.092>
• Qiu Xunlin, Mellinger Axel, Wegener Michael, Wirges Werner, Gerhard Reimund: Barrier discharges in cellular polypropylene ferroelectrets: How do they influence the electromechanical properties?. J Appl Phys 2007, 101, 104112. <http://dx.doi.org/10.1063/1.2735410>
• Merbahi N., Ledru G., Sewraj N., Marchal F.: Electrical behavior and vacuum ultraviolet radiation efficiency of monofilamentary xenon dielectric barrier discharges. J Appl Phys 2007, 101, 123309. <http://dx.doi.org/10.1063/1.2745121>
• Janus H W: Contribution of Stark broadening to the Balmer H_α line profile observed from barrier discharges in Ar/H₂ gas mixtures. J Phys D Appl Phys 2007, 40, 3608. <http://dx.doi.org/10.1088/0022-3727/40/12/009>
• Zhu W, Takano N, Schoenbach K H, Guru D, McLaren J, Heberlein J, May R, Cooper J R: Direct current planar excimer source. J Phys D Appl Phys 2007, 40, 3896. <http://dx.doi.org/10.1088/0022-3727/40/13/S09>
• Shuaibov A. K., Shevera I. V., General A. A.: Emission characteristics of a gas-discharge plasma of water vapor in the vacuum UV region of the spectrum. J Appl Spectrosc 2006, 73, 932. <http://dx.doi.org/10.1007/s10812-006-0179-9>
• Sugimura Hiroyuki, Lee Kyung-Hwang, Sano Hikaru, Toyokawa Ryohei: Micropatterning of self-assembled monolayers on silicon amplified with photochemically generated atomic oxygen. Colloid Surf A Phys Eng Aspects 2006, 284-285, 561. <http://dx.doi.org/10.1016/j.colsurfa.2005.10.035>
• Beleznai Sz, Mihajlik G, Agod A, Maros I, Juhasz R, Németh Zs, Jakab L, Richter P: High-efficiency dielectric barrier Xe discharge lamp: theoretical and experimental investigations. J Phys D Appl Phys 2006, 39, 3777. <http://dx.doi.org/10.1088/0022-3727/39/17/012>
• Motoyama Yoshikazu, Kurosawa Kou, Yokotani Atushi: Electrical properties of SiO2 films deposited by photon-assisted CVD with vacuum-ultraviolet excimer lamp. Electron Comm Jpn Pt II 2005, 88, 36. <http://dx.doi.org/10.1002/ecjb.10196>
• Kim Dae Su, Seo Woo Hyun: Ultraviolet-curing behavior and mechanical properties of a polyester acrylate resin. J Appl Polym Sci 2004, 92, 3921. <http://dx.doi.org/10.1002/app.20422>
• Laroussi M., Lu X., Kolobov V., Arslanbekov R.: Power consideration in the pulsed dielectric barrier discharge at atmospheric pressure. J Appl Phys 2004, 96, 3028. <http://dx.doi.org/10.1063/1.1777392>
• Kogelschatz U: Atmospheric-pressure plasma technology. Plasma Phys Control Fusion 2004, 46, B63. <http://dx.doi.org/10.1088/0741-3335/46/12B/006>
• Xiaoliang Tang, Xianping Feng, Gao Qiu, Yonghui Yan, Yuncheng Shi: Investigation of Atmospheric Pressure Plasma Discharge and Its Application to Surface Modification of Blood-Filtering Material. Plasma Sci Tech 2004, 6, 2463. <http://dx.doi.org/10.1088/1009-0630/6/5/007>
• Tkachev A. N., Yakovlenko S. I.: Simulations of plasma formation in the cathode sheath of an efficient excimer lamp. Tech Phys 2003, 48, 190. <http://dx.doi.org/10.1134/1.1553559>
• Lindner Michael, Bauer-Gogonea Simona, Bauer Siegfried, Paajanen Mika, Raukola Jaakko: Dielectric barrier microdischarges: Mechanism for the charging of cellular piezoelectric polymers. J Appl Phys 2002, 91, 5283. <http://dx.doi.org/10.1063/1.1459751>
• El-Dakrouri A, Yan J, Gupta M C, Laroussi M, Badr Y: VUV emission from a novel DBD-based radiation source. J Phys D Appl Phys 2002, 35, L109. <http://dx.doi.org/10.1088/0022-3727/35/21/101>
• Kogelschatz Ulrich: Industrial innovation based on fundamental physics*. Plasma Sources Sci Technol 2002, 11, A1. <http://dx.doi.org/10.1088/0963-0252/11/3A/301>
• Kogelschatz U.: Filamentary, patterned, and diffuse barrier discharges. IEEE Trans Plasma Sci 2002, 30, 1400. <http://dx.doi.org/10.1109/TPS.2002.804201>
• HIROSE Kenichi, SUGAHARA Hiroshi, MATSUNO Hiromitsu: Basic Performance of VUV Exposure Systems Using Head-on Type Ar2* and Kr2* DBD Excimer Lamps. J Light & Vis Env 2002, 26, 35. <http://dx.doi.org/10.2150/jlve.26.1_35>
• Boyd Ian W., Zhang Jun-Ying: Photo-induced growth of dielectrics with excimer lamps. Sol St Electr 2001, 45, 1413. <http://dx.doi.org/10.1016/S0038-1101(00)00259-8>
• Lippert T., David C., Dickinson J.T., Hauer M., Kogelschatz U., Langford S.C., Nuyken O., Phipps C., Robert J., Wokaun A.: Structure property relations of photoreactive polymers designed for laser ablation. J Photochem Photobiol A Chem 2001, 145, 145. <http://dx.doi.org/10.1016/S1010-6030(01)00577-9>
• Boyd Ian W, Zhang Jun-Ying: Low temperature photoformation of tantalum oxide. J Microelectron Reliab 2000, 40, 649. <http://dx.doi.org/10.1016/S0026-2714(99)00299-1>
• Kogelschatz U, Esrom H, Zhang J.-Y, Boyd I.W: High-intensity sources of incoherent UV and VUV excimer radiation for low-temperature materials processing. Appl Surf 2000, 168, 29. <http://dx.doi.org/10.1016/S0169-4332(00)00571-7>
• Zhang Jun-Ying, Boyd Ian W.: Lifetime investigation of excimer UV sources. Appl Surf 2000, 168, 296. <http://dx.doi.org/10.1016/S0169-4332(00)00628-0>
• Schoenbach Karl H., El-Habachi Ahmed, Moselhy Mohamed M., Shi Wenhui, Stark Robert H.: Microhollow cathode discharge excimer lamps. Phys Plasmas 2000, 7, 2186. <http://dx.doi.org/10.1063/1.874039>
• Adler F, Müller S: J Phys D Appl Phys 2000, 33, 1705. <http://dx.doi.org/10.1088/0022-3727/33/14/310>
• Xu Yonglong, Xu Xueji: One Dimensional Self-consistent Model for Xenon Dielectic Barrier Discharge (DBD). Phys Scr 2000, 62, 76. <http://dx.doi.org/10.1238/Physica.Regular.062a00076>
• Zhang J: UV intensity measurement of 308 nm excimer lamp using chemical actinometer. Appl Surf Sci 1999, 138-139, 315. <http://dx.doi.org/10.1016/S0169-4332(98)00412-7>
• Falkenstein Zoran: Effects of the O[sub 2] concentration on the removal efficiency of volatile organic compounds with dielectric barrier discharges in Ar and N[sub 2]. J Appl Phys 1999, 85, 525. <http://dx.doi.org/10.1063/1.369484>
• Ametepe Joseph D., Diggs Jessie, Manos Dennis M., Kelley Michael J.: Characterization and modeling of a microwave driven xenon excimer lamp. J Appl Phys 1999, 85, 7505. <http://dx.doi.org/10.1063/1.370547>
• Morimoto Yukihiro, Nozawa Shigenori, Hosono Hideo: Effect of Xe2* light (7.2 eV) on the infrared and vacuum ultraviolet absorption properties of hydroxyl groups in silica glass. Phys Rev B 1999, 59, 4066. <http://dx.doi.org/10.1103/PhysRevB.59.4066>
• Zhang Jun-Ying, Boyd Ian W.: UV light-induced deposition of low dielectric constant organic polymer for interlayer dielectrics. Optic Mater 1998, 9, 251. <http://dx.doi.org/10.1016/S0925-3467(97)00109-2>
• He Ziming, Prelas Mark A., Meese Jon M., Lin Li-Te: Microwave excitation and applications of an elliptical excimer lamp. Laser Part Beams 1998, 16, 509. <http://dx.doi.org/10.1017/S0263034600011319>
• Zhang Jun-Ying, Boyd Ian W.: Efficient XeI[sup ∗] excimer ultraviolet sources from a dielectric barrier discharge. J Appl Phys 1998, 84, 1174. <http://dx.doi.org/10.1063/1.368182>
• Vollkommer F., Hitzschke L.: Beratender Ausschuß der Industriephysiker: Durchbruch bei der effizienten Erzeugung von Excimer-Strahlung: Hohe Erwartungen an die Leuchtstofforschung. Phys. Bl. 1997, 53, 887. <http://dx.doi.org/10.1002/phbl.19970530912>
• Zhang Jun-Ying, Boyd I.W.: Photo-induced deposition of low dielectric constant polyimide film for interlayer dielectric applications. Electron Lett 1997, 33, 911. <http://dx.doi.org/10.1049/el:19970603>
• Schoenbach Karl H, El-Habachi Ahmed, Shi Wenhui, Ciocca Marco: Plasma Sources Sci Technol 1997, 6, 468. <http://dx.doi.org/10.1088/0963-0252/6/4/003>
• Sosnin É. A., Tarasenko V. F.: A planar XeCl-exilamp pumped by a low-pressure glow discharge. Tech Phys 1997, 42, 1411. <http://dx.doi.org/10.1134/1.1258887>
• Boyd Ian W., Zhang Jun-Ying: Low Temperature Si Oxidation with Excimer Lamp Sources. Mat Res Symp Proc 1997, 470, 343. <http://dx.doi.org/10.1557/PROC-470-343>
• Zhang Jun-Ying, Boyd Ian W.: Development of Large area Excimer VUV and UV Sources from a Dielectric Barrier Discharge. MRS Proc 1997, 471, 53. <http://dx.doi.org/10.1557/PROC-471-53>
• Zhang Z. Y., Boyd I. W., Esrom H.: Surface Modification of Polyethylene Terephthalate with Excimer UV Radiation. Surf Interface Anal 1996, 24, 718. <http://dx.doi.org/10.1002/(SICI)1096-9918(19960930)24:10<718::AID-SIA182>3.0.CO;2-W>
• Taylor R. S., Leopold K. E.: Surface corona discharge excited rare gas halide lamps. Rev Sci Instrum 1996, 67, 2100. <http://dx.doi.org/10.1063/1.1147022>
• Zhang Jun-Ying, Boyd Ian W.: Efficient excimer ultraviolet sources from a dielectric barrier discharge in rare-gas/halogen mixtures. J Appl Phys 1996, 80, 633. <http://dx.doi.org/10.1063/1.362871>
• Breazeal W., Flynn K., Gwinn E.: Static and dynamic two-dimensional patterns in self-extinguishing discharge avalanches. Phys Rev E 1995, 52, 1503. <http://dx.doi.org/10.1103/PhysRevE.52.1503>
• Zhang Jun-Ying, Esrom Hilmar, Kogelschatz Ulrich, Emig Gerhard: Modification of polymers with UV excimer radiation from lasers and lamps. Journal of Adhesion Science and Technology 1994, 8, 1179. <http://dx.doi.org/10.1163/156856194X01022>
• Köhler Jürgen: Dielectric barrier discharge pumped N_2 laser. Appl Opt 1994, 33, 3812. <http://dx.doi.org/10.1364/AO.33.003812>
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• Gellert B.: UV-Generation in Dielectric Barrier Discharges. Contrib Plasma Phys 1991, 31, 247. <http://dx.doi.org/10.1002/ctpp.2150310208>
• Esrom Hilmar, Zhang Jun-Ying, Kogelschatz Ulrich: Large Area Photochemical Dry Etching of Polymers with Incoherent Excimer UV Radiation. MRS Proc 1991, 236, 39. <http://dx.doi.org/10.1557/PROC-236-39>