Pure and Applied Chemistry, 1980, Volume 52, No. 7, pp. 1759-1765

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Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1759-1765

http://dx.doi.org/10.1351/pac198052071759

Plasma deposition and etching reactors for semiconductor applications

J. L. Vossen

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Conference

Fourth International Symposium on Plasma Chemistry, Zurich, Switzerland, 27 August–1 September 1979

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