Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1759-1765
http://dx.doi.org/10.1351/pac198052071759
Plasma deposition and etching reactors for semiconductor applications
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Pure Appl. Chem., 1980, Vol. 52, No. 7, pp. 1759-1765
http://dx.doi.org/10.1351/pac198052071759