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Fourth International Symposium on Plasma Chemistry, Zurich, Switzerland, 27 August–1 September 1979

This conference is part of the Plasma Chemistry series.
P. Fauchais and J.-M. Baronnet
State of the art of plasma chemical synthesis of homogenous and heterogenous products
1980, Vol. 52, Issue 7, pp. 1669-1705 [Details] [Full text - pdf 937 kB]
C. Bonet
Thermal plasma technology for processing of refractory materials
1980, Vol. 52, Issue 7, pp. 1707-1720 [Details] [Full text - pdf 377 kB]
M. Capitelli
Progress in the kinetics of chemical reactions in non-equilibrium plasmas
1980, Vol. 52, Issue 7, pp. 1721-1738 [Details] [Full text - pdf 536 kB]
H. Helm, T. D. Mark and W. Lindinger
Plasma sampling - a versatile tool in plasma chemistry
1980, Vol. 52, Issue 7, pp. 1739-1757 [Details] [Full text - pdf 566 kB]
J. L. Vossen
Plasma deposition and etching reactors for semiconductor applications
1980, Vol. 52, Issue 7, pp. 1759-1765 [Details] [Full text - pdf 196 kB]
S. W. Benson
The prediction of thermochemical and kinetic data for gas phase reactions. Current status
1980, Vol. 52, Issue 7, pp. 1767-1771 [Details] [Full text - pdf 126 kB]