Fourth International Symposium on Plasma Chemistry, Zurich, Switzerland, 27 August–1 September 1979
This conference is part of the Plasma Chemistry series.
State of the art of plasma chemical synthesis of homogenous and heterogenous products
Thermal plasma technology for processing of refractory materials
Progress in the kinetics of chemical reactions in non-equilibrium plasmas
Plasma sampling - a versatile tool in plasma chemistry
Plasma deposition and etching reactors for semiconductor applications
The prediction of thermochemical and kinetic data for gas phase reactions. Current status