X International Symposium on Plasma Chemistry, Bochum, Federal Republic of Germany, 4–9 August 1991
This conference is part of the Plasma Chemistry series.
Preface
Non-resolved problems of theoretical and applied plasma chemistry
Nonequilibrium effects in thermal plasmas
Electron and mass spectrometric analysis of plasma controlled surfaces and thin films
Modelling in thermal plasma and electric arc column
Generation of thermal and pseudo-thermal plasmas
Diagnostics for particulate vaporization and interactions with surfaces
The diagnostics of thermal plasmas
Electrode erosion in high power thermal arcs
Arc behaviour and plasma chemistry in electrode erosion
Plasma cutting in atmosphere and under water
Utilizing plasma technology for chemical reactions in controlled atmosphere
Plasma application in the steel industry in Japan
Diagnostics of plasmas by CARS (coherent anti-Stokes Raman scattering)
Progress in the modeling of H- and D- ion sources
Control of reactive plasmas: adventure to improve and to expand plasma processing
Chemistry of titanium dry etching in fluorinated and chlorinated gases
Dual atom beam studies of etching and related surface chemistries
Plasma polymerization and surface treatment of polymers
Novel approaches to plasma deposition of amorphous silicon-based materials
Process and property relationships in hard coatings made by plasma and ion-assisted methods
Photothermal characterization of plasma surface modifications
Plasma deposition of a-C/B:H layers in textor
Diamond synthesis by thermal-plasma CVD (chemical vapor deposition)
Plasma-surface interaction phenomena induced by corona discharges. Application to aerosols detection and to diagnosis on surface layers