Author detail
Articles by Toyonobu Yoshida
- Toward a new era of plasma spray processing
The following name might also represent this author:
T. Yoshida
- High rate deposition of thick epitaxial films by thermal plasma flash evaporation
- The future of thermal plasma processing for coating
- Chemistry of crown thioether complexes of low-valent second-row transition metals
- Stereoelectronic modulation of dioxygen coordination
Affiliations
- Department of Materials Engineering, Graduate School of Engineering,The University of Tokyo, 7-3-1, Hongo, Bunkyo-ku, Tokyo 113-8656, Japan