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Pure Appl. Chem., 2010, Vol. 82, No. 6, pp. 1301-1315

Published online 2010-05-04

Experimental and modeling study of O and Cl atoms surface recombination reactions in O2 and Cl2 plasmas

Luc Stafford1*, Joydeep Guha2,3, Rohit Khare2, Stefano Mattei1, Olivier Boudreault1, Boris Clain1 and Vincent M. Donnelly2

1 Department of Physics, University of Montréal, Montréal, Québec, H3C 3J7, Canada
2 Department of Chemical and Biomolecular Engineering, University of Houston, Houston, TX 77204, USA
3 Lam Research Corporation, Fremont, CA 94538, USA

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  • Kholodkova N. V., Kholodkov I. V., Abramov A. V.: Heterogeneous recombination of O(3P) atoms on the surface of aluminum in air plasma. Surf. Engin. Appl.Electrochem. 2013, 49, 107. <>
  • Khare Rohit, Srivastava Ashutosh, Donnelly Vincent M.: Interactions of chlorine plasmas with silicon chloride-coated reactor walls during and after silicon etching. J. Vac. Sci. Technol. A 2012, 30, 051306. <>
  • Primc Gregor, Zaplotnik Rok, Vesel Alenka, Mozetic Miran: Microwave discharge as a remote source of neutral oxygen atoms. AIP Advances 2011, 1, 022129. <>