Pure and Applied Chemistry, 2010, Volume 82, No. 6, pp. 1283-1299, Cited by

Pure Appl. Chem., 2010, Vol. 82, No. 6, pp. 1283-1299

http://dx.doi.org/10.1351/PAC-CON-09-09-20

Published online 2010-04-20

Modeling of the plasma chemistry and plasma–surface interactions in reactive plasmas

Annemie Bogaerts*, Christophe De Bie, Maxie Eckert, Violeta Georgieva, Tom Martens, Erik Neyts and Stefan Tinck

PLASMANT research group, Department of Chemistry, University of Antwerp, Universiteitsplein 1, B-2610 Wilrijk, Belgium

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Mehrabian S., Xu S., Qaemi A. A., Shokri B., Ostrikov K.: Ion impact distribution over plasma exposed nanocone arrays. Phys. Plasmas 2013, 20, 033501. <http://dx.doi.org/10.1063/1.4794327>
Li Zhi, Zhao Zhen, Li Xuehui: Numerical model of an Ar/NH3 atmospheric pressure direct current discharge in parallel plate geometry. Phys Plasmas 2012, 19, 033510. <http://dx.doi.org/10.1063/1.3691894>
Gallon Helen J., Tu Xin, Twigg Martyn V., Whitehead J. Christopher: Plasma-assisted methane reduction of a NiO catalyst—Low temperature activation of methane and formation of carbon nanofibres. Catal B Environ 2011, 106, 616. <http://dx.doi.org/10.1016/j.apcatb.2011.06.023>
Marchack Nathan, Chang Jane P: Perspectives in nanoscale plasma etching: what are the ultimate limits?. J Phys D Appl Phys 2011, 44, 174011. <http://dx.doi.org/10.1088/0022-3727/44/17/174011>