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Pure Appl. Chem., 2010, Vol. 82, No. 6, pp. 1247-1258

http://dx.doi.org/10.1351/PAC-CON-09-10-43

Published online 2010-04-20

High-power impulse magnetron sputtering and its applications

Arutiun P. Ehiasarian

Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Howard St., Sheffield, S1 1WB, UK

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  • Rtimi Sami, Baghriche Oualid, Pulgarin Cesar, Arutiun Ehiasarian, Ralf Bandorf, Kiwi John: Comparison of HIPIMS sputtered Ag- and Cu-surfaces leading to accelerated bacterial inactivation in the dark. Surface and Coatings Technology 2014. <http://dx.doi.org/10.1016/j.surfcoat.2014.02.029>
  • Velicu Ioana-Laura, Tiron Vasile, Popa Gheorghe: Dynamics of the fast-HiPIMS discharge during FINEMET-type film deposition. Surface and Coatings Technology 2014. <http://dx.doi.org/10.1016/j.surfcoat.2014.03.015>
  • Rtimi S., Baghriche O., Sanjines R., Pulgarin C., Ben-Simon M., Lavanchy J.-C., Houas A., Kiwi J.: Photocatalysis/catalysis by innovative TiN and TiN-Ag surfaces inactivate bacteria under visible light. Applied Catalysis B: Environmental 2012, 123-124, 306. <http://dx.doi.org/10.1016/j.apcatb.2012.04.047>
  • Bouzakis Konstantinos-Dionysios, Michailidis Nikolaos, Skordaris Georgios, Bouzakis Emmanouil, Biermann Dirk, M'Saoubi Rachid: Cutting with coated tools: Coating technologies, characterization methods and performance optimization. CIRP Annals - Manufacturing Technology 2012, 61, 703. <http://dx.doi.org/10.1016/j.cirp.2012.05.006>
  • Boutwell R.C., Wei M., Scheurer A., Mares J.W., Schoenfeld W.V., Tiron V., Sirghi L., Popa G., Nose K., Suwa T., Fujita R., Kamiko M., Mitsuda Y.: Optical and structural properties of NiMgO thin films formed by sol���gel spin coating. Thin Solid Films 2012, 520, 4302. <http://dx.doi.org/10.1016/j.tsf.2012.02.079>
  • Tiron Vasile, Costin Claudiu, Sirghi Lucel, Popa Gheorghe: Reactive HIPIMS with auxiliary Al electrode for ZnO:Al thin film deposition. IOP Conf. Ser.: Mater. Sci. Eng. 2012, 39, 012010. <http://dx.doi.org/10.1088/1757-899X/39/1/012010>
  • Gudmundsson J. T., Brenning N., Lundin D., Helmersson U.: High power impulse magnetron sputtering discharge. J. Vac. Sci. Technol. A 2012, 30, 030801. <http://dx.doi.org/10.1116/1.3691832>
  • Mishra A, Kelly P J, Bradley J W: The 2D plasma potential distribution in a HiPIMS discharge. J Phys D Appl Phys 2011, 44, 425201. <http://dx.doi.org/10.1088/0022-3727/44/42/425201>