High-power impulse magnetron sputtering and its applications

Ehiasarian, Arutiun P.

doi:10.1351/PAC-CON-09-10-43

Pure Appl. Chem., 2010, Vol. 82, No. 6, pp. 1247-1258

http://dx.doi.org/10.1351/PAC-CON-09-10-43

Published online 2010-04-20

High-power impulse magnetron sputtering and its applications

Arutiun P. Ehiasarian

Nanotechnology Centre for PVD Research, Materials and Engineering Research Institute, Sheffield Hallam University, Howard St., Sheffield, S1 1WB, UK

Abstract: High-power impulse magnetron sputtering (HIPIMS) was introduced in the late 1990s as a unique physical vapor deposition method. The technology utilizes magnetron sputtering cathodes and high peak power density of up to 3 kW cm^–2 on the target. The plasma produces a metal flux with high degree of ionization. HIPIMS has been successfully used as a substrate pretreatment method to enhance coating adhesion by promoting local epitaxial growth. As a deposition technology, HIPIMS produces high-density microstructure films. It has been industrialized and has successful applications in hard, electronic, and optical coatings.