Pure and Applied Chemistry

Pure Appl. Chem., 2010, Vol. 82, No. 6, pp. 1209-1222

http://dx.doi.org/10.1351/PAC-CON-09-11-05

Published online 2010-04-20

Diagnostic-based modeling on a micro-scale atmospheric-pressure plasma jet

References

• 1. E. Stoffels, I. E. Kieft, R. E. J. Sladek, L. J. M. van den Bedem, E. P. van der Laan, M. Steinbuch. Plasma Sources Sci. Technol. 15, S169 (2006). (http://dx.doi.org/10.1088/0963-0252/15/4/S03)
• 2. R. Foest, E. Kindel, H. Lange, A. Ohl, M. Stieber, K.-D. Weltmann. Contrib. Plasma Phys. 47, 119 (2007). (http://dx.doi.org/10.1002/ctpp.200710017)
• 3. K. Becker, A. Koutsospyros, S. M. Yin, C. Christodoulatos, N. Abramzon, J. C. Joaquin, G. Brelles-Marino. Plasma Phys. Controlled Fusion 47, B513 (2005). (http://dx.doi.org/10.1088/0741-3335/47/12B/S37)
• 4. K.-D. Weltmann, R. Brandenburg, T. von Woedtke, J. Ehlbeck, R. Foest, M. Stieber, E. Kindel. J. Phys. D: Appl. Phys. 41, 194008 (2008). (http://dx.doi.org/10.1088/0022-3727/41/19/194008)
• 5. A. Schütze, J. Y. Jeong, S. E. Babayan, J. Park, G. S. Selwyn, R. F. Hicks. IEEE Trans. Plasma Sci. 26, 1685 (1998). (http://dx.doi.org/10.1109/27.747887)
• 6. K. Niemi, St. Reuter, L. Schaper, N. Knake, V. Schulz-von der Gathen, T. Gans. J. Phys.: Conf. Series 71, 012012 (2007). (http://dx.doi.org/10.1088/1742-6596/71/1/012012)
• 7. V. Schulz-von der Gathen, V. Buck, T. Gans, N. Knake, K. Niemi, S. Reuter, L. Schaper, J. Winter. Contrib. Plasma Phys. 47, 510 (2007). (http://dx.doi.org/10.1002/ctpp.200710066)
• 8. J. Y. Jeong, J. Park, I. Henins, S. E. Babayan, V. J. Tu, G. S. Selwyn, G. Ding, R. F. Hicks. J. Phys. Chem. A 104, 8027 (2000). (http://dx.doi.org/10.1021/jp0012449)
• 9. V. Schulz-von der Gathen, L. Schaper, N. Knake, St. Reuter, K. Niemi, T. Gans, J. Winter. J. Phys. D: Appl. Phys. 41, 194004 (2008). (http://dx.doi.org/10.1088/0022-3727/41/19/194004)
• 10. M. Geigl, S. Peters, O. Gabriel, B. Krames, J. Meichsner. Contrib. Plasma Phys. 45, 369 (2005). (http://dx.doi.org/10.1002/ctpp.200510042)
• 11. K. Niemi, V. Schulz-von der Gathen, H. F. Döbele. Plasma Sources Sci. Technol. 14, 375 (2005). (http://dx.doi.org/10.1088/0963-0252/14/2/021)
• 12. J. W. Coburn, M. Chen. J. Appl. Phys. 51, 3134 (1980). (http://dx.doi.org/10.1063/1.328060)
• 13. R. E. Walkup, K. L. Saenger, G. S. Selwyn. J. Chem. Phys. 84, 2668 (1986). (http://dx.doi.org/10.1063/1.450339)
• 14. H. M. Katsch, A. Tewes, E. Quandt, A. Goehlich, T. Kawetzki, H. F. Döbele. J. Appl. Phys. 88, 6232 (2000). (http://dx.doi.org/10.1063/1.1315332)
• 15. G. Park, H. Lee, G. Kim, J. K. Lee. Plasma Processes Polym. 5, 569 (2008). (http://dx.doi.org/10.1002/ppap.200800019)
• 16. S. Reuter, K. Niemi, V. Schulz-von der Gathen, H. F. Döbele. Plasma Sources Sci. Technol. 18, 015006 (2009). (http://dx.doi.org/10.1088/0963-0252/18/1/015006)
• 17. N. Knake, S. Reuter, K. Niemi, V. Schulz-von der Gathen, J. Winter. J. Phys. D: Appl. Phys. 41, 194006 (2008). (http://dx.doi.org/10.1088/0022-3727/41/19/194006)
• 18. N. Knake, K. Niemi, S. Reuter, V. Schulz-von der Gathen, J. Winter. Appl. Phys. Lett. 93, 131503 (2008). (http://dx.doi.org/10.1063/1.2995983)
• 19. J. J. Shi, M. G. Kong. J. Appl. Phys. 97, 023306 (2005). (http://dx.doi.org/10.1063/1.1834978)
• 20. C. M. O. Mahony, T. Gans, W. G. Graham, P. D. Maguire, Z. Lj. Petrovi?. Appl. Phys. Lett. 93, 011501 (2008). (http://dx.doi.org/10.1063/1.2956412)
• 21. K. Niemi, S. Reuter, L. M. Graham, J. Waskoenig, T. Gans. Appl. Phys. Lett. 95, 151504 (2009). (http://dx.doi.org/10.1063/1.3242382)
• 22. K. Niemi, S. Reuter, L. M. Graham, J. Waskoenig, N. Knake, V. Schulz-von der Gathen, T. Gans. J. Phys. D: Appl. Phys. 43, 124006 (2010). (http://dx.doi.org/10.1088/0022-3727/43/12/124006)
• 23. G. J. M. Hagelaar, L. C. Pitchford. Plasma Sources Sci. Technol. 14, 722 (2005). (http://dx.doi.org/10.1088/0963-0252/14/4/011)
• 24. G. S. Selwyn, H. W. Herrmann, J. Park, I. Henins. Contrib. Plasma Phys. 6, 610 (2001). (http://dx.doi.org/10.1002/1521-3986(200111)41:6<610::AID-CTPP610>3.0.CO;2-L)
• 25. N. Sadeghi, D. W. Setser, A. Francis, U. Czarnetzki, H. F. Döbele. J. Chem. Phys. 115, 3144 (2001). (http://dx.doi.org/10.1063/1.1388037)
• 26. J. E. Chilton, J. B. Boffard, R. S. Schappe, C. C. Lin. Phys. Rev. A 57, 267 (1998). (http://dx.doi.org/10.1103/PhysRevA.57.267)
• 27. M. B. Schulman, F. A. Scharpton, S. Chung, C. C. Lin, L. W. Anderson. Phys. Rev. A 32, 2100 (1985). (http://dx.doi.org/10.1103/PhysRevA.32.2100)
• 28. L. L. Laher, F. R. Gilmore. J. Phys. Chem. Ref. Data 19, 277 (1990). (http://dx.doi.org/10.1063/1.555872)
• 29. X. Yuan, L. L. Raja. IEEE Trans. Plasma Sci. 31, 495 (2003). (http://dx.doi.org/10.1109/TPS.2003.815479)
• 30. Y. Sakiyama, D. B. Graves. J. Phys. D: Appl. Phys. 39, 3644 (2006). (http://dx.doi.org/10.1088/0022-3727/39/16/018)
• 31. D. S. Stafford, M. J. Kushner. J. Appl. Phys. 96, 2451 (2004). (http://dx.doi.org/10.1063/1.1768615)
• 32. H. W. Ellis, R. Y. Pai, W. McDaniel, E. A. Mason, L. A. Viehland. At. Data Nucl. Data Tables 17, 177 (1976). (http://dx.doi.org/10.1016/0092-640X(76)90001-2)
• 33. Y. Sakiyama, D. B. Graves. J. Appl. Phys. 101, 073306 (2007). (http://dx.doi.org/10.1063/1.2715745)
• 34. J. J. Shi, M. G. Kong. J. Appl. Phys. 97, 023306 (2005). (http://dx.doi.org/10.1063/1.1834978)
• 35. K. De Bleecker, D. Herrebout, A. Bogaerts, R Gijbels, P. Descamps. J. Phys. D: Appl. Phys. 36, 1826 (2003). (http://dx.doi.org/10.1088/0022-3727/36/15/313)
• 36. R. J. Kee, G. Dixon-Lewis, J. Warnatz, M. E. Coltrin, J. M. Miller. Sandia Report SAND86-8246 (1986).
• 37. J. J. Shi, M. Kong. IEEE Trans. Plasma Sci. 33, 624 (2005).
• 38. Comsol Multiphysics 3.4. Herfordshire, AL10 9AB: COMSOL Ltd. (2007).
• 39. Matlab 7.5. MathWorks, Natick, MA (2007).
• 40. T. Gans, Chun C. Lin, V. Schulz-von der Gathen, H. F. Döbele. Phys. Rev. A 67, 012707 (2003). (http://dx.doi.org/10.1103/PhysRevA.67.012707)
• 41. K. Dittmann, D. Drozdov, B. Krames, J. Meichsner. J. Phys. D: Appl. Phys. 40, 6593 (2007). (http://dx.doi.org/10.1088/0022-3727/40/21/019)
• 42. L. Schaper, S. Reuter, J. Waskoenig, K. Niemi, V. Schulz-von der Gathen, T. Gans. J. Phys.: Conf. Series 162, 012013 (2009). (http://dx.doi.org/10.1088/1742-6596/162/1/012013)
• 43. J. Waskoenig, D. O’Connell, V. Schulz-von der Gathen, J. Winter, S.-J. Park, J. G. Eden. Appl. Phys. Lett. 92, 101503 (2008). (http://dx.doi.org/10.1063/1.2894227)
• 44. H. Boettner, J. Waskoenig, D. O’Connell, T. L. Kim, P. A. Tchertchian, J. Winter, V. Schulz-von der Gathen. J. Phys. D: Appl. Phys. 43, 124010 (2010). (http://dx.doi.org/10.1088/0022-3727/43/12/124010)