Pure and Applied Chemistry

CrossRef Cited-by Linking

• Ji Longfei, Liu Dongping, Zhou Xinwei, Song Ying, Ni Weiyuan, Niu Jinhai, Fan Hongyu: Rapid growth of amorphous carbon films on the inner surface of micron-thick and hollow-core fibers. Thin Solid Films 2013, 544, 482. <http://dx.doi.org/10.1016/j.tsf.2013.02.072>
• Donnelly Vincent M., Kornblit Avinoam: Plasma etching: Yesterday, today, and tomorrow. J. Vac. Sci. Technol. A 2013, 31, 050825. <http://dx.doi.org/10.1116/1.4819316>
• Cuddy Michael F., Blechle Joshua M., Fisher Ellen R.: Ion contributions to gas–surface interactions in inductively-coupled fluorocarbon plasmas. International Journal of Mass Spectrometry 2012, 330-332, 46. <http://dx.doi.org/10.1016/j.ijms.2012.09.006>
• Knoops H. C. M., Langereis E., van de Sanden M. C. M., Kessels W. M. M.: Reaction mechanisms of atomic layer deposition of TaNx from Ta(NMe2)5 precursor and H2-based plasmas. J Vacuum Sci Technol A Vacuum Surf Films 2012, 30, 01A101. <http://dx.doi.org/10.1116/1.3625565>
• Shimizu Hideharu, Sakoda Kaoru, Momose Takeshi, Koshi Mitsuo, Shimogaki Yukihiro: Hot-wire-assisted atomic layer deposition of a high quality cobalt film using cobaltocene: Elementary reaction analysis on NHx radical formation. J Vacuum Sci Technol A Vacuum Surf Films 2012, 30, 01A144. <http://dx.doi.org/10.1116/1.3666034>
• Khare Rohit, Srivastava Ashutosh, Donnelly Vincent M.: Interactions of chlorine plasmas with silicon chloride-coated reactor walls during and after silicon etching. J. Vac. Sci. Technol. A 2012, 30, 051306. <http://dx.doi.org/10.1116/1.4742319>
• Sarra-Bournet Christian, Gherardi Nicolas, Glénat Hervé, Laroche Gaétan, Massines Francoise: Effect of C2H4/N2 Ratio in an Atmospheric Pressure Dielectric Barrier Discharge on the Plasma Deposition of Hydrogenated Amorphous Carbon-Nitride Films (a-C:N:H). Plasma Chem Plasma Process 2010, 30, 213. <http://dx.doi.org/10.1007/s11090-010-9214-y>
• Sarra-Bournet Christian, Gherardi Nicolas, Laroche Gaétan, Massines Francoise: Formation of nanoparticles and nanorods in a N2–C2H4–H2 atmospheric pressure dielectric barrier Townsend discharge. This Solid Films 2010, 518, 4828. <http://dx.doi.org/10.1016/j.tsf.2010.01.062>
• Liu Dongping, Gu Jiandong, Feng Zhiqing, Li Dongming, Niu Jinhai, Benstetter Günther: Comparison of fluorocarbon film deposition by pulsed/continuous wave and downstream radio frequency plasmas. Vacuum 2010, 85, 253. <http://dx.doi.org/10.1016/j.vacuum.2010.06.005>
• Martin Ina T., Teplin Charles W., Doyle James R., Branz Howard M., Stradins Paul: Physics and chemistry of hot-wire chemical vapor deposition from silane: Measuring and modeling the silicon epitaxy deposition rate. J Appl Phys 2010, 107, 054906. <http://dx.doi.org/10.1063/1.3298455>
• Cuddy Michael F., Fisher Ellen R.: Investigation of the roles of gas-phase CF[sub 2] molecules and F atoms during fluorocarbon plasma processing of Si and ZrO[sub 2] substrates. J Appl Phys 2010, 108, 033303. <http://dx.doi.org/10.1063/1.3467776>
• Mao M, Bogaerts A: Investigating the plasma chemistry for the synthesis of carbon nanotubes/nanofibres in an inductively coupled plasma enhanced CVD system: the effect of different gas mixtures. J Phys D Appl Phys 2010, 43, 205201. <http://dx.doi.org/10.1088/0022-3727/43/20/205201>
• Vassallo E, Barison S, Cremona A, Grosso G, Fabrizio M, Laguardia L: Evaluation of the scavenging effect by low temperature laboratory plasmas driven with radiofrequency. Plasma Phys Control Fusion 2010, 52, 075014. <http://dx.doi.org/10.1088/0741-3335/52/7/075014>
• Liu Dongping, Gu Jiandong, Feng Zhiqing, Li Dongming, Niu Jinhai: Plasma deposition of fluorocarbon thin films using pulsed /continuous and downstream radio frequency plasmas. This Solid Films 2009, 517, 3011. <http://dx.doi.org/10.1016/j.tsf.2008.11.105>
• Stillahn Joshua M., Trevino Kristina J., Fisher Ellen R.: Plasma Diagnostics for Unraveling Process Chemistry. Annu Rev Anal Chem 2008, 1, 261. <http://dx.doi.org/10.1146/annurev.anchem.1.031207.112953>
• Gordillo-Vázquez F. J., Herrero V. J., Tanarro I.: From Carbon Nanostructures to New Photoluminescence Sources: An Overview of New Perspectives and Emerging Applications of Low-Pressure PECVD. Chem Vap Deposition 2007, 13, 267. <http://dx.doi.org/10.1002/cvde.200604034>
• Chifen Anye N., Jenkins A. Toby A., Knoll Wolfgang, Förch Renate: Adhesion Improvement of Plasma-Polymerized Maleic Anhydride Films on Gold Using HMDSO/O2 Adhesion Layers. Plasma Process Polym 2007, 4, 815. <http://dx.doi.org/10.1002/ppap.200700012>
• Liu Dongping, Zhou Jie, Fisher Ellen R.: Correlation of gas-phase composition with film properties in the plasma-enhanced chemical vapor deposition of hydrogenated amorphous carbon nitride films. J Appl Phys 2007, 101, 023304. <http://dx.doi.org/10.1063/1.2424402>
• Liu Dongping, Fisher Ellen R.: Comparison of surface reactivity of CN, NH, and NH[sub 2] radicals during deposition of amorphous carbon nitride films from inductively coupled rf plasmas. J Vac Sci Technol A 2007, 25, 368. <http://dx.doi.org/10.1116/1.2699216>
• Liu Dongping, Martin Ina T., Fisher Ellen R.: CF2 surface reactivity during hot filament and plasma-enhanced chemical vapor deposition of fluorocarbon films. chem phys letts 2006, 430, 113. <http://dx.doi.org/10.1016/j.cplett.2006.08.123>