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Pure Appl. Chem., 2006, Vol. 78, No. 6, pp. 1127-1145

Formation of soot particles in Ar/H2/CH4 microwave discharges during nanocrystalline diamond deposition: A modeling approach

K. Hassouni, F. Mohasseb, F. Bénédic, G. Lombardi and A. Gicquel

LIMHP, CNRS-UPR1311, Université Paris 13, 99 Avenue J. B. Clément, 93430 Villetaneuse, France

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  • Bystrov K., van de Sanden M.C.M., Arnas C., Marot L., Mathys D., Liu F., Xu L.K., Li X.B., Shalpegin A.V., De Temmerman G.: Spontaneous synthesis of carbon nanowalls, nanotubes and nanotips using high flux density plasmas. Carbon 2014, 68, 695. <>
  • Gurentsov Evgeny, Priemchenko Konstantin, Grimm Helge, Orthner Hans, Wiggers Hartmut, Borchers Christine, Jander Helga, Eremin Alexander, Schulz Christof: Synthesis of Small Carbon Nanoparticles in a Microwave Plasma Flow Reactor. Zeitschrift für Physikalische Chemie 2013, 227, 357. <>
  • Bogaerts Annemie, Eckert Maxie, Mao Ming, Neyts Erik: Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials. J Phys D Appl Phys 2011, 44, 174030. <>
  • Arnas C., Pardanaud C., Martin C., Roubin P., De Temmerman G., Counsell G.: Analyses of dust samples collected in the MAST tokamak. J  Nucl Mater 2010, 401, 130. <>
  • May P. W., Harvey J. N., Allan N. L., Richley J. C., Mankelevich Yu. A.: Simulations of chemical vapor deposition diamond film growth using a kinetic Monte Carlo model and two-dimensional models of microwave plasma and hot filament chemical vapor deposition reactors. J Appl Phys 2010, 108, 114909. <>
  • Hassouni K, Silva F, Gicquel A: Modelling of diamond deposition microwave cavity generated plasmas. J Phys D Appl Phys 2010, 43, 153001. <>
  • Arnas C, Martin C, Roubin P, Pégourié B, De Temmerman G, Hassouni K, Michau A, Lombardi G, Bonnin X: Similarities and differences between dust produced in laboratory plasmas and in the MAST and Tore Supra tokamaks. Plasma Phys Control Fusion 2010, 52, 124007. <>
  • Fox O.J.L., Ma J., May P.W., Ashfold M.N.R., Mankelevich Yu.A.: The role of inert gas in MW-enhanced plasmas for the deposition of nanocrystalline diamond thin films. Diamond Related Mat 2009, 18, 750. <>
  • Arnas C., Mouberi A., Hassouni K., Michau A., Lombardi G., Bonnin X., Bénédic F., Pégourié B.: Carbon dust formation in a cold plasma from cathode sputtering. J  Nucl Mater 2009, 390-391, 140. <>
  • Bénédic Fabien, Duten Xavier, Syll Ousmane, Lombardi Guillaume, Hassouni Khaled, Gicquel Alix: Spectroscopic Diagnostics of Pulsed Microwave Plasmas used for Nanocrystalline Diamond Growth. Chem Vap Deposition 2008, 14, 173. <>
  • May Paul W., Mankelevich Yuri A.: From Ultrananocrystalline Diamond to Single Crystal Diamond Growth in Hot Filament and Microwave Plasma-Enhanced CVD Reactors: a Unified Model for Growth Rates and Grain Sizes. J. Phys. Chem. C 2008, 112, 12432. <>
  • Monéger D., Bénédic F., Azouani R., Chelibane F., Syll O., Silva F., Gicquel A.: Deposition of nanocrystalline diamond films in pulsed Ar/H2/CH4 microwave discharges. Diamond Related Mat 2007, 16, 1295. <>
  • Rennick C. J., Ma J., Henney J. J., Wills J. B., Ashfold M. N. R., Orr-Ewing A. J., Mankelevich Yu. A.: Measurement and modeling of Ar∕H[sub 2]∕CH[sub 4] arc jet discharge chemical vapor deposition reactors. I. Intercomparison of derived spatial variations of H atom, C[sub 2], and CH radical densities. J Appl Phys 2007, 102, 063309. <>