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Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 459-464

http://dx.doi.org/10.1351/pac200274030459

Comparative characterization of high-density plasma reactors using emission spectroscopy from VUV to NIR

Yi-Kang Pu1*, Zhi-Gang Guo1, Zheng-De Kang1, Jie Ma1, Zhi-Cheng Guan1, Guang-Yu Zhang2 and En-Ge Wang2

1 Department of Electrical Engineering, Tsinghua University, Beijing 100084, China
2 Institute of Physics, Chinese Academy of Sciences, Beijing 100080, China

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  • Ma Jie, Pu Yi-Kang: Tuning the electron temperature of a nitrogen plasma by adding helium and argon. Phys Plasmas 2003, 10, 4118. <http://dx.doi.org/10.1063/1.1605950>