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Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 435-439

Nonthermal and nonequilibrium effects in high-power pulsed ICP and application to surface modification of materials

T. Ishigaki1*, N. Okada1, N. Ohashi1, H. Haneda1 and T. Sakuta2

1 Advanced Materials Laboratory, National Institute for Materials Science, Namiki 1-1, Tsukuba, Ibaraki 305-0044, Japan
2 Department of Electrical and Electronic Engineering, Kanazawa University, Kodatsuno, Kanazawa, Ishikawa 920-0942, Japan

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  • Wang J.B., Hu Z.S., Zhong X.L., Zhang Y.J., Ishigaki T., Sekiguchi T.: Luminescent properties of ZnO thin films treated by pulse-modulated high-power inductively coupled plasma. Appl Surf Sci 2011, 257, 7156. <>
  • Ye Rubin, Ishigaki Takamasa: Nonequilibrium situations in a pulse-modulated Ar–H2 inductively coupled thermal plasma for hydrogen doping. This Solid Films 2008, 516, 4407. <>
  • ISHIGAKI Takamasa: Synthesis of ceramic nanoparticles with non-equilibrium crystal structures and chemical compositions by controlled thermal plasma processing. J Ceram Soc Japan 2008, 116, 462. <>
  • Ye Rubin, Murphy Anthony B., Ishigaki Takamasa: Numerical Modeling of an Ar–H2 Radio-Frequency Plasma Reactor under Thermal and Chemical Nonequilibrium Conditions. Plasma Chem Plasma Process 2007, 27, 189. <>
  • Vissokov Gheorghi, Zaharieva Katerina: Nanodispersed Oxides-Plasma-Chemical Synthesis and Properties. Plasma Sci Tech 2007, 9, 603. <>
  • Ishigaki Takamasa, Ohashi Naoki, Taguchi Hiroyuki, Ye Rubin, Haneda Hajime, Ito Shigeru: Improved UV emission of zinc oxide through hyrogen doping in pulse-modulated high-power ICP. This Solid Films 2006, 506-507, 303. <>
  • Ye Rubin, Ishigaki Takamasa, Taguchi Hiroyuki, Ito Shigeru, Murphy Anthony B., Lange Hubert: Characterization of the behavior of chemically reactive species in a nonequilibrium inductively coupled argon-hydrogen thermal plasma under pulse-modulated operation. J Appl Phys 2006, 100, 103303. <>
  • ISHIGAKI Takamasa: Journal of The Surface Finishing Society of Japan 2006, 57, 18. <>
  • Ye R., Ishigaki T.: Modeling of transient nonequilibrium phenomena in an inductively coupled plasma under pulsed power conditions. J Appl Phys 2005, 97, 123306. <>
  • Ye Rubin, Ishigaki Takamasa, Sakuta Tadahiro: Controlled generation of pulse-modulated RF plasmas for materials processing. Plasma Sources Sci Technol 2005, 14, 387. <>
  • Ye R., Ishigaki T., Boulos M. I.: Modeling of an induction plasma under transient turbulent flow conditions. J Appl Phys 2004, 96, 118. <>
  • Ohashi Naoki, Ishigaki Takamasa, Okada Nobuhiro, Taguchi Hiroyuki, Sakaguchi Isao, Hishita Shunichi, Sekiguchi Takashi, Haneda Hajime: Passivation of active recombination centers in ZnO by hydrogen doping. J Appl Phys 2003, 93, 6386. <>
  • Ohashi Naoki, Ishigaki Takamasa, Okada Nobuhiro, Sekiguchi Takashi, Sakaguchi Isao, Haneda Hajime: Effect of hydrogen doping on ultraviolet emission spectra of various types of ZnO. Appl Phys Lett 2002, 80, 2869. <>
  • Ohashi Naoki, Ishigaki Takamasa, Sekiguchi Takashi, Sakaguchi Isao, Haneda Hajime: Passivation of Defects in ZnO by Hydrogen Plasma Irradiation. Mater Res Soc Proc 2002, 744, M5.3. <>