Pure and Applied Chemistry

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• Quintieri L., Pistillo B.R., Caputo L., Favia P., Baruzzi F.: Bovine lactoferrin and lactoferricin on plasma-deposited coating against spoilage Pseudomonas spp. Innovative Food Science & Emerging Technologies 2013, 20, 215. <http://dx.doi.org/10.1016/j.ifset.2013.04.013>
• Montarsolo A., Mossotti R., Innocenti R., Vassallo E.: A study on washing resistance of pp-HMDSO films deposited on wool fabrics for anti-pilling purposes. Surface and Coatings Technology 2013, 224, 109. <http://dx.doi.org/10.1016/j.surfcoat.2013.03.007>
• Vogelsang Andreas, Ohl Andreas, Foest Rüdiger, Schröder Karsten, Weltmann Klaus-Dieter: Deposition of Thin Films from Amino Group Containing Precursors with an Atmospheric Pressure Microplasma Jet. Plasma Process Polym 2011, 8, 77. <http://dx.doi.org/10.1002/ppap.201000103>
• Fanelli Fiorenza, d'Agostino Riccardo, Fracassi Francesco: GC-MS Investigation of Hexamethyldisiloxane-Oxygen Fed Cold Plasmas: Low Pressure Versus Atmospheric Pressure Operation. Plasma Process Polym 2011, 8, 932. <http://dx.doi.org/10.1002/ppap.201000201>
• Siliprandi Riccardo A., Zanini Stefano, Grimoldi Elisa, Fumagalli Francesco S., Barni Ruggero, Riccardi Claudia: Atmospheric Pressure Plasma Discharge for Polysiloxane Thin Films Deposition and Comparison with Low Pressure Process. Plasma Chem Plasma Process 2011, 31, 353. <http://dx.doi.org/10.1007/s11090-011-9286-3>
• Michaeli Walter, von Fragstein Friederike, Bahroun Karim, Behm Henrik, Hopmann Christian: Investigations on the influence of hygroscopic surfaces on the plasma-assisted modification of polyamide. Surface and Coatings Technology 2011, 205, S506. <http://dx.doi.org/10.1016/j.surfcoat.2011.03.091>
• Yangchuan Ke, Yuguo Wang, Li Yang: Improving the hydrophobic, water barrier and crystallization properties of poly(ethylene terephthalate) by incorporating monodisperse SiO2 particles. Polym Int 2010, 59, 1350. <http://dx.doi.org/10.1002/pi.2874>
• Coclite Anna Maria, Ozaydin-Ince Gozde, Palumbo Fabio, Milella Antonella, Gleason Karen K.: Single-Chamber Deposition of Multilayer Barriers by Plasma Enhanced and Initiated Chemical Vapor Deposition of Organosilicones. Plasma Process Polym 2010, 7, 561. <http://dx.doi.org/10.1002/ppap.200900139>
• Coclite Anna Maria, Milella Antonella, Palumbo Fabio, Le Pen Christophe, d'Agostino Riccardo: Plasma Deposited Organosilicon Multistacks for High-Performance Low-Carbon Steel Protection. Plasma Process Polym 2010, 7, 802. <http://dx.doi.org/10.1002/ppap.201000017>
• Coclite Anna Maria, Milella Antonella, d'Agostino Riccardo, Palumbo Fabio: On the relationship between the structure and the barrier performance of plasma deposited silicon dioxide-like films. Surface Coatings and Technology 2010, 204, 4012. <http://dx.doi.org/10.1016/j.surfcoat.2010.05.024>
• Vinogradov Igor, Lunk Achim: Film Deposition in the Dielectric Barrier Discharge at Atmospheric Pressure in He/O2 /HMDSO and He/N2 O/HMDSO mixtures. Plasma Processes Polym. 2009, 6, S514. <http://dx.doi.org/10.1002/ppap.200931102>
• Avramidis Georg, Hauswald Evelyn, Lyapin Andrey, Militz Holger, Viöl Wolfgang, Wolkenhauer Arndt: Plasma treatment of wood and wood-based materials to generate hydrophilic or hydrophobic surface characteristics. Wood Mat Sc & Eng 2009, 4, 52. <http://dx.doi.org/10.1080/17480270903281642>
• Yun Jungheum, Lee Sunghun, Jeong Yujeong, Lee Hong-Rim, Kwon Jung-Dae, Lee Gun-Hwan: Reduction of Defects in SiO_x Vapor Permeation Barriers on Polymer Substrates by Introducing a Sputtered Interlayer . Jpn J Appl Phys 2009, 48, 055503. <http://dx.doi.org/10.1143/JJAP.48.055503>
• Francescangeli Adriano, Palumbo Fabio, d'Agostino Riccardo: Deposition of Barrier Coatings from Vinyltrimethylsilane-Fed Glow Discharges. Plasma Process Polym 2008, 5, 708. <http://dx.doi.org/10.1002/ppap.200800041>
• Di Mundo Rosa, Palumbo Fabio, Fracassi Francesco, d'Agostino Riccardo: Methylaminosilane fed Inductively Coupled Plasmas for Silicon Nitride Deposition. Plasma Process Polym 2008, 5, 770. <http://dx.doi.org/10.1002/ppap.200800060>
• Nakamura K.: Application of droplet-free metal ion source to formation of gas barrier thin films. phys stat sol (c) 2008, 5, 887. <http://dx.doi.org/10.1002/pssc.200778335>
• Deilmann Michael, Theiß Sebastian, Awakowicz Peter: Pulsed microwave plasma polymerization of silicon oxide films: Application of efficient permeation barriers on polyethylene terephthalate. Surface Coatings and Technology 2008, 202, 1911. <http://dx.doi.org/10.1016/j.surfcoat.2007.08.034>
• Naddaf M, Saloum S: Visible photoluminescence from plasma-polymerized-organosilicone thin films deposited from HMDSO/O₂ induced remote plasma: effect of oxygen fraction. J Phys D Appl Phys 2008, 41, 175206. <http://dx.doi.org/10.1088/0022-3727/41/17/175206>
• Nam Nguyen Dang, Kim Jung-Gu, Kim Duck Jin, Lee Nae Eung: Evaluation of Reliability of Transparent SiOCH by Electrochemical Methods . Jpn J Appl Phys 2008, 47, 6982. <http://dx.doi.org/10.1143/JJAP.47.6982>
• Vinogradov Igor, Zimmer Daniel, Lunk Achim: Diagnostics of SiCOH-Film-Deposition in the Dielectric Barrier Discharge at Atmospheric Pressure. Plasma Process Polym 2007, 4, S435. <http://dx.doi.org/10.1002/ppap.200731202>
• Senesi G.S., D’Aloia E., Gristina R., Favia P., d’Agostino R.: Surface characterization of plasma deposited nano-structured fluorocarbon coatings for promoting in vitro cell growth. Surf Sei 2007, 601, 1019. <http://dx.doi.org/10.1016/j.susc.2006.11.046>
• Furuta Hiroshi, Furuta Mamoru, Matsuda Tokiyoshi, Hiramatsu Takahiro, Hirao Takashi: SiO₂ Insulator Film Synthesized at 100 °C Using Tetramethylsilane by Inductively Coupled Plasma Chemical Vapor Deposition . Jpn J Appl Phys 2007, 46, L237. <http://dx.doi.org/10.1143/JJAP.46.L237>
• Wu Tianbin, Ke Yangchuan: The absorption and thermal behaviors of PET–SiO2 nanocomposite films. Polym Deg Stabil 2006, 91, 2205. <http://dx.doi.org/10.1016/j.polymdegradstab.2006.01.005>
• Zambov Ludmil, Weidner Ken, Shamamian Vasgen, Camilletti Robert, Pernisz Udo, Loboda Mark, Cerny Glenn, Gidley David, Peng Hua-Gen, Vallery Richard: Advanced chemical vapor deposition silicon carbide barrier technology for ultralow permeability applications. J Vac Sci Technol A 2006, 24, 1706. <http://dx.doi.org/10.1116/1.2214694>
• d'Agostino Riccardo, Fracassi Francesco, Palumbo Fabio, Angelini Emma, Grassini Sabrina, Rosalbino Francesco: Protection of Silver-Based Alloys from Tarnishing by Means of Plasma-Enhanced Chemical Vapor Deposition. Plasma Process Polym 2005, 2, 91. <http://dx.doi.org/10.1002/ppap.200400031>
• Zanini S., Riccardi C., Orlandi M., Esena P., Tontini M., Milani M., Cassio V.: Surface properties of HMDSO plasma treated polyethylene terephthalate. Surface Coatings and Technology 2005, 200, 953. <http://dx.doi.org/10.1016/j.surfcoat.2005.01.093>