Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 401-405
http://dx.doi.org/10.1351/pac200274030401
Role of ions in SiO2 deposition with pulsed and continuous helicon plasmas
Christine Charles
Plasma Research Laboratory, Research School of Physical Sciences and Engineering, The Australian National University, Canberra, ACT 0200, Australia
Individual author index pages
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A.-L. Thomann, J. P. Rozenbaum, P. Brault, C. Andreazza, P. Andreazza, B. Rousseau, H. Estrade-Szwarckopf, A. Berthet, J. C. Bertolini, F. J. Cadete Santos Aires, F. Monnet, C. Mirodatos, C. Charles and R. Boswell
Plasma synthesis of catalytic thin films
