Pure and Applied Chemistry

CrossRef Cited-by Linking

• Lee J. H., Yoon Y. S., Kim M. J.: Non-invasive in situ plasma monitoring of reactive gases using the floating harmonic method for inductively coupled plasma etching application. Rev. Sci. Instrum. 2013, 84, 043502. <http://dx.doi.org/10.1063/1.4799972>
• Bodart P., Brihoum M., Cunge G., Joubert O., Sadeghi N.: Analysis of pulsed high-density HBr and Cl2 plasmas: Impact of the pulsing parameters on the radical densities. Journal of Appl Phys 2011, 110, 113302. <http://dx.doi.org/10.1063/1.3663443>
• Gou F., Kleyn A. W., Gleeson M. A.: The application of molecular dynamics to the study of plasma–surface interactions: CF _x with silicon. Int Rev Phys Chem 2008, 27, 229. <http://dx.doi.org/10.1080/01442350801928014>
• Kogelschatz Martin, Cunge Gilles, Sadeghi Nader: Identification of halogen containing radicals in silicon etching plasmas and density measurement by UV broad band absorption spectroscopy. J Phys D Appl Phys 2004, 37, 1954. <http://dx.doi.org/10.1088/0022-3727/37/14/010>
• Cunge G, Kogelschatz M, Sadeghi N: Influence of reactor walls on plasma chemistry and on silicon etch product densities during silicon etching processes in halogen-based plasmas. Plasma Sources Sci Technol 2004, 13, 522. <http://dx.doi.org/10.1088/0963-0252/13/3/019>
• SADEGHI Nader: 6. Molecular Spectroscopy Techniques Applied for Processing Plasma Diagnostics. J Plasma Fusion Res 2004, 80, 767. <http://dx.doi.org/10.1585/jspf.80.767>