Pure and Applied Chemistry, 2002, Volume 74, No. 3, pp. 381-395, Cited by

Pure Appl. Chem., 2002, Vol. 74, No. 3, pp. 381-395

http://dx.doi.org/10.1351/pac200274030381

Study for plasma etching of dielectric film in semiconductor device manufacturing. Review of ASET research project

Makoto Sekine

Plasma Technology Laboratory, Association of Super-advanced Electronics Technologies (ASET), 292 Yoshida, Yokohama 244-0817, Japan

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