Pure and Applied Chemistry

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• Andreeva Alena V., Kutsarev Ilya, Shatsky Alexander V., Shterenberg Alexander M., Zyn Vladislav I.: Pre-polymerization Kinetics in Continuous and Pulsed Glow Discharge in Tetrafluoroethylene. Plasma Processes Polym. 2012, 9, 772. <http://dx.doi.org/10.1002/ppap.201100204>
• Henniges Ute, Okubayashi Satoko, Rosenau Thomas, Potthast Antje: Irradiation of Cellulosic Pulps: Understanding Its Impact on Cellulose Oxidation. Biomacromolecules 2012, 121128103310005. <http://dx.doi.org/10.1021/bm3014457>
• Hegemann Dirk, Körner Enrico, Chen Shang, Benedikt Jan, von Keudell Achim: Functional plasma polymers deposited in capacitively and inductively coupled plasmas. Appl Phvs Lett 2012, 100, 051601. <http://dx.doi.org/10.1063/1.3681382>
• Zaharieva Katerina, Vissokov Gheorghi, Grabis Janis, Rakovsky Slavcho: Plasma-Chemical Synthesis of Nanosized Powders-Nitrides, Carbides, Oxides, Carbon Nanotubes and Fullerenes. Plasma Sci. Technol. 2012, 14, 980. <http://dx.doi.org/10.1088/1009-0630/14/11/06>
• Lee Seungmoo, Won Jaihyung, Choi Jongsik, Park Jihun, Jee Yeonhong, Lee Hyeondeok, Byun Dongjin: Comparative study on the properties of amorphous carbon layers deposited from 1-hexene and propylene for dry etch hard mask application in semiconductor device manufacturing. This Solid Films 2011, 519, 6683. <http://dx.doi.org/10.1016/j.tsf.2011.04.077>
• Pernot Pascal, Plessis Sylvain, Carrasco Nathalie: Probabilistic representations of partial branching ratios: bridging the gap between experiments and chemical models. Conf Series 2011, 300, 012027. <http://dx.doi.org/10.1088/1742-6596/300/1/012027>
• Tsai Jeff T.H., Lin Tsung-Ying, Chua Daniel H.C.: Low-temperature fabrication of nanocrystalline silicon thin films on mechanically flexible substrates by vacuum arc discharge. J Mater Res 2011, 26, 1076. <http://dx.doi.org/10.1557/jmr.2011.48>
• Plessis Sylvain, Carrasco Nathalie, Pernot Pascal: Knowledge-based probabilistic representations of branching ratios in chemical networks: The case of dissociative recombinations. J Chem Phys 2010, 133, 134110. <http://dx.doi.org/10.1063/1.3479907>
• Zijlmans R A B, Welzel S, Gabriel O, Yagci G, van Helden J H, Röpcke J, Schram D C, Engeln R: Experimental study of surface contributions to molecule formation in a recombining N₂/O₂ plasma. J Phys D Appl Phys 2010, 43, 115204. <http://dx.doi.org/10.1088/0022-3727/43/11/115204>
• Touimi S, Jauberteau J L, Jauberteau I, Aubreton J: Plasma chemistry and diagnostic in an Ar–N₂–H₂ microwave expanding plasma used for nitriding treatments. J Phys D Appl Phys 2010, 43, 205203. <http://dx.doi.org/10.1088/0022-3727/43/20/205203>
• Wünderlich D., Dietrich S., Fantz U.: Application of a collisional radiative model to atomic hydrogen for diagnostic purposes. J Quant Spectrosc Radiat 2009, 110, 62. <http://dx.doi.org/10.1016/j.jqsrt.2008.09.015>
• Schram Daan C: Is plasma unique? The presence of electrons and the importance of charge. Plasma Sources Sci Technol 2009, 18, 014003. <http://dx.doi.org/10.1088/0963-0252/18/1/014003>
• Schram D C, Zijlmans R A B, Gabriel O, Engeln R: Dissociative recombination as primary dissociation channel in plasma chemistry. J Phys Conf Ser 2009, 192, 012012. <http://dx.doi.org/10.1088/1742-6596/192/1/012012>
• Zijlmans R A B, Gabriel O, Welzel S, Hempel F, Röpcke J, Engeln R, Schram D C: Molecule synthesis in an Ar?CH₄?O₂?N₂ microwave plasma. Plasma Sources Sci Technol 2006, 15, 564. <http://dx.doi.org/10.1088/0963-0252/15/3/036>